Magnetized substrate carrier apparatus with shadow mask for deposition

A process chamber, comprising:

• a chamber body covered by a lid;
• a target disposed within the chamber body adjacent the lid;
• a substrate support disposed within the chamber body opposite the target;
• and
• a substrate carrier apparatus retained on the substrate support, wherein the substrate carrier apparatus includes a carrier plate having a support surface to support a substrate and a shadow mask disposed above the carrier plate and within an annular frame, wherein the annular frame includes a lip extending radially inwardly and an inner portion of the lip is coupled to an outermost portion of the shadow mask, wherein a radially inner surface of the lip is sloped in a radially inward and downward direction, and wherein one or more magnets are disposed on or embedded within the substrate carrier apparatus to create a magnetic field above the support surface.

A substrate carrier apparatus, comprising:

• a carrier plate having a support surface to support a substrate, wherein the support surface is textured to minimize the substrate from moving along the support surface;
• a mask assembly disposed above the support surface, wherein the mask assembly includes an annular frame and a shadow mask disposed within the annular frame, wherein the annular frame includes a lip extending radially inwardly and an inner portion of the lip is coupled to an outermost portion of the shadow mask, and wherein the shadow mask includes one or more openings arranged in a predetermined pattern and disposed through the shadow mask;
• and
• one or more magnets disposed on or embedded within at least one of the carrier plate or the shadow mask to create a magnetic field above the support surface.