Photocurable composition
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsKeisuke Kawashima, Koso Matsuno
Life of this patent
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Abstract
Provided is a photocurable composition including a component (A) which is an acrylic ester compound containing one or more acryloyl groups in one molecule; a component (B) which is an acrylic ester compound containing one or more acryloyl groups and one or more epoxy groups in one molecule; a component (C) which is a compound containing two or more thiol groups in one molecule; a component (D) which is a photoradical generator; and a component (E) which is a photobase generator, in which a ratio between a total mass of the component (A) and the component (B) and a mass of the component (C) is in a range of 67.8:32.2 to 88.0:12.0, inclusive.
Claims9
A photocurable composition consisting of:
- a component (A) which is an acrylic ester compound containing one or more acryloyl groups in one molecule;
- a component (B) which is an acrylic ester compound containing one or more acryloyl groups and one or more epoxy groups in one molecule;
- a component (C) which is a compound containing two or more thiol groups in one molecule;
- a component (D) which is a photoradical generator;
- and
- a component (E) which is a photobase generator,
- wherein a ratio between (i) a total mass of the component (A) and the component (B) and (ii) a mass of the component (C) is in a range of 67.8:32.2 to 88.0:12.0, inclusive.
Dependencies are inferred from the claim text.