Method and system for enhanced single particle reflectance imaging
AssigneeTrustees of Boston University
InventorsSelim M. Unlu, Oguzhan Avci, Derin Sevenler
Life of this patent
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AssigneeTrustees of Boston University
InventorsSelim M. Unlu, Oguzhan Avci, Derin Sevenler
Estimating the term…
An enhanced single particle interferometric reflectance imaging system includes an illumination source configured to produce illumination light along an illumination path toward a target substrate. The target substrate can be configured to reflect the illuminating light along one or more collection paths toward one or more imaging sensors. The target substrate includes a base substrate having a first reflecting surface and a transparent spacer layer having a first surface in contact with the first reflecting surface and a second reflecting surface on a side opposite to the first surface. The transparent spacer layer has a predefined thickness that is determined as a function of a wavelength of the illuminating light and produces a predefined radiation pattern of optical scattering when nanoparticles are positioned on or near the second reflective surface. In addition, one or more of the collection paths can also include an amplitude mask selected to match the radiation pattern.
An interferometric reflectance imaging system for characterization of nanoparticles comprising:
A method for imaging nanoparticles comprising:
Dependencies are inferred from the claim text.