Method for manufacturing electronic device and method for removing impurity using same
AssigneeEwha University-Industry Collaboration Foundation
InventorsSang Wook Lee, Dong Hoon Shin
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AssigneeEwha University-Industry Collaboration Foundation
InventorsSang Wook Lee, Dong Hoon Shin
Estimating the term…
Provided are a method for manufacturing an electronic device capable of efficiently utilizing a material and a method for removing impurities using the same. The method for manufacturing an electronic device comprises the steps of: placing a transfer film on a plurality of functional layers which are positioned apart from each other on a source substrate; bringing a first transfer target into close contact with the lower surface of the transfer film by applying pressure to a portion of the transfer film that corresponds to the first transfer target from among the plurality of functional layers by using a probe; separating the transfer film from the source substrate in a state in which the first transfer target is in close contact with the lower surface; placing the transfer film on a target substrate in the state in which the first transfer target is in close contact with the lower surface; placing the first transfer target on the target substrate by applying pressure to a portion of the transfer film that corresponds to the first transfer target; and separating the transfer film from the target substrate in a state in which the first transfer target is positioned on the target surface.
A method for manufacturing an electronic device, comprising:
A method for manufacturing an electronic device, comprising:
A method for removing an impurity, comprising:
A method for removing an impurity, comprising:
Dependencies are inferred from the claim text.