# US 11,029,601 B2 · Positive tone photopatternable silicone

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- Number: US 11,029,601 B2
- Document ID: US11029601B2
- Status: Granted
- Kind: B2
- Application number: 16/969,096
- Filed: 2019-02-04
- Published: 2021-02-04
- Granted: 2021-06-08
- Earliest claimed: 2018-04-24
- Assignees: Dow Silicones Corporation
- Applicants: Dow Silicones Corporation
- Inventors: Lizhi Liu; Peng-Fei Fu
- Web page: https://patentgrep.com/patent/US11029601B2

## CPC

- G03F 7/0757: {Macromolecular compounds containing Si-O, Si-C or Si-N bonds (G03F7/0752 takes precedence)}
- G03F 7/0045: {with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors}
- G03F 7/0755: {Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds (G03F7/0752 takes precedence)}
- G03F 7/2002: {with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A method for producing a patterned silicone layer; said method comprising steps of: (a) depositing on a substrate a composition comprising: (i) a polysiloxane comprising alkenyl groups, (ii) a silane crosslinker comprising silicon-hydrogen bonds, (iii) a hydrosilylation catalyst, and (iv) a photolatent amine generator, to form an uncured resin; (b) exposing the uncured resin to ultraviolet light or electron beam irradiation through a mask to produce a patterned resin; (c) heating the patterned resin; and (e) removing at least a part of the uncured portion of the patterned resin to produce a final patterned silicone layer.

## Claims

### Claim 1

A method for producing a patterned silicone layer; said method comprising steps of: (a) depositing on a substrate a composition comprising: (i) a polysiloxane comprising alkenyl groups, (ii) a silane crosslinker comprising silicon-hydrogen bonds, (iii) a hydrosilylation catalyst, and (iv) a photolatent amine generator, to form an uncured resin; (b) exposing the uncured resin to ultraviolet light or electron beam irradiation through a mask to produce a patterned resin; (c) heating the patterned resin; and (d) removing at least a part of the uncured portion of the patterned resin to produce a final patterned silicone layer.

### Claim 2 (depends on 1)

The method of claim 1 in which the polysiloxane comprising alkenyl groups comprises from 0.5 to 20 wt % alkenyl groups.

### Claim 3 (depends on 2)

The method of claim 2 in which the polysiloxane comprising alkenyl groups is an alkenyl-terminated polysiloxane, a vinyl-substituted MQ resin or a combination thereof.

### Claim 4 (depends on 3)

The method of claim 3 in which the silane crosslinker is a compound having at least three silicon-hydrogen bonds or a polymer having from 0.01 to 2.0 wt % SiH.

### Claim 5 (depends on 4)

The method of claim 4 in which the alkenyl-terminated polysiloxane comprises units of R1R2SiO2/2 and alkenyl end groups; wherein R1 and R2 independently represent C1-C20 substituted or unsubstituted hydrocarbyl groups.

### Claim 6

A composition comprising (i) a polysiloxane comprising alkenyl groups, (ii) a silane crosslinker comprising silicon-hydrogen bonds, (iii) a hydrosilylation catalyst, and (iv) a photolatent amine generator; wherein the composition comprises no more than 0.1 wt % siloxane units having epoxy groups based on weight of composition solids; wherein the polysiloxane comprising alkenyl groups comprises from 0.5 to 20 wt % alkenyl groups; and wherein the polysiloxane comprising alkenyl groups is (A) an alkenyl-terminated polysiloxane that comprises units of R1R2SiO2/2 and alkenyl end groups, wherein R1 and R2 independently represent C1-C20 substituted or unsubstituted hydrocarbyl groups, (B) a vinyl-substituted MQ resin; or (C) a combination thereof; and wherein the silane crosslinker is a compound having at least three silicon-hydrogen bonds or a polymer having from 0.01 to 2.0 wt % SiH.

### Claim 7 (depends on 6)

The composition of claim 6, wherein the polysiloxane comprising alkenyl groups is a difunctional vinyl-terminated polydimethylsiloxane, a vinyl-substituted MQ resin or a combination thereof.