# US 11,029,555 B2 · Colour film substrate and manufacturing method therefor, and display panel > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,029,555 B2 - Document ID: US11029555B2 - Status: Granted - Kind: B2 - Application number: 16/316,909 - Filed: 2018-05-14 - Published: 2019-09-26 - Granted: 2021-06-08 - Earliest claimed: 2017-06-06 - Assignees: Chongqing Boe Optoelectronics Technology Co., Ltd.; Boe Technology Group Co., Ltd. - Applicants: Chongqing Boe Optoelectronics Technology Co., Ltd.; Boe Technology Group Co., Ltd. - Inventors: Xiongzhou Wei; Min Li; Qiang Xiong; Chao Liu; Jiaqi Pang; Bin Wan; Hongyu Sun - Web page: https://patentgrep.com/patent/US11029555B2 ## CPC - G02F 1/133516: {Methods for their manufacture, e.g. printing, electro-deposition or photolithography} - G02F 1/1335: Structural association of cells with optical devices, e.g. polarisers or reflectors - G02F 1/133512: {Light shielding layers, e.g. black matrix (G02F1/136209 takes precedence)} - G02F 1/133514: {Colour filters} - G03F 7/0007: {Filters, e.g. additive colour filters; Components for display devices} - G03F 7/105: having substances, e.g. indicators, for forming visible images - G03F 7/40: Treatment after imagewise removal, e.g. baking - G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A color filter (CF) substrate, a manufacturing method thereof and a display panel are provided. The manufacturing method of the substrate includes: providing a base substrate; and forming a black matrix layer and a plurality of first sub-pixel units on the base substrate, wherein the black matrix layer and the plurality of first sub-pixel units are made of photoresist of a same material, the material of the photoresist includes an irreversible thermochromic pigment, the photoresist is changed into black color upon being heated, and a color of the photoresist before color change is the same as a color of the first sub-pixel units. ## Claims ### Claim 1 A manufacturing method of a color filter (CF) substrate, comprising: providing a base substrate; and forming a black matrix layer and a plurality of first sub-pixel units on the base substrate, by coating a photoresist and patterning the photoresist to form the black matrix layer and the plurality of sub-pixel units in the same photoresist material, which comprises a red, green, blue or yellow pigment and an irreversible thermochromic pigment, the photoresist is capable of being changed into black color upon being heated, and a color of the photoresist before color change is the same as a color of the first sub-pixel units which is red, blue, green or yellow, the black matrix layer is formed by selectively heating the photoresist which is red, blue, green or yellow in the desired black matrix layer pattern to color the photoresist black, wherein a weight percent of the irreversible thermochromic pigment is more than 10 wt % and less than or equal to 25 wt %. ### Claim 2 (depends on 1) The manufacturing method of the color filter substrate according to claim 1, wherein forming the black matrix layer and the plurality of first sub-pixel units on the base substrate comprises: providing the photoresist on the base substrate to form a photoresist layer; patterning the photoresist layer to form a pattern layer, the pattern layer comprising a plurality of opening regions arranged in an array and a strip-shaped reserved region configured to form the plurality of first sub-pixel units; and heating a region of the pattern layer other than a determined region to form the black matrix layer and the plurality of first sub-pixel units arranged at intervals, the determined region being located in the strip-shaped reserved region and being overlapped with a region where the plurality of first sub-pixel units is located. ### Claim 3 (depends on 2) The manufacturing method of the color filter substrate according to claim 2, wherein patterning the photoresist layer is performed with a first mask, and the first mask comprises a light-shielding region and a light-transmitting region in which the plurality of opening regions is to be formed. ### Claim 4 (depends on 2) The manufacturing method of the color filter substrate according to claim 2, wherein heating the region of the pattern layer other than the determined region comprises: heating the pattern layer by using a heating layer, a portion of the heating layer corresponding to the determined region being a heat insulation region. ### Claim 5 (depends on 4) The manufacturing method of the color filter substrate according to claim 4, wherein the heat insulation region comprises a notch or a heat insulating layer. ### Claim 6 (depends on 1) The manufacturing method of the color filter substrate according to claim 1, wherein forming the black matrix layer and the plurality of first sub-pixel units on the base substrate comprises: providing the photoresist on the base substrate to form a first photoresist layer; patterning the first photoresist layer to form a pattern layer having a shape the same as that of the black matrix layer; heating the pattern layer to form the black matrix layer; and providing the photoresist on the black matrix layer to form a second photoresist layer, patterning the second photoresist layer to form the plurality of first sub-pixel units. ### Claim 7 (depends on 1) The manufacturing method of the color filter substrate according to claim 1, wherein a color of the first sub-pixel unit is yellow, the manufacturing method of the color filter substrate further comprises: forming a plurality of second sub-pixel units, a plurality of third sub-pixel units and a plurality of fourth sub-pixel units. ### Claim 8 (depends on 7) The manufacturing method of the color filter substrate according to claim 7, wherein, in addition to the red, green, blue or yellow pigment, the photoresist material further comprises: 20-50 parts by weight of resin; 10-30 parts by weight of activated diluent; 20-40 parts by weight of solvent; 1-5 part(s) by weight of photoinitiator; and 2-8 parts by weight of promotor, wherein the irreversible thermochromic pigment is (NH4)3PO4.(MoO3)12. ### Claim 9 (depends on 8) The manufacturing method of the color filter substrate according to claim 8, wherein a transmittance of the photoresist before the color change is 20.1%˜40.2%. ### Claim 10 (depends on 7) The manufacturing method of the color filter substrate according to claim 7, wherein the first through fourth sub-pixel units are respectively color filters with different colors. ### Claim 11 (depends on 10) The manufacturing method of the color filter substrate according to claim 10, wherein the second sub-pixel units are red color filter, the third sub-pixel units are green color filters, and the fourth sub-pixel units are blue color filters. ### Claim 12 A color filter substrate, comprising: a base substrate; a black matrix layer located on the base substrate; and a color filter layer filled in an opening region of the black matrix layer, the color filter layer comprising first sub-pixel units of a same color which is red, blue green or yellow, wherein a photoresist for forming the black matrix layer is the same as a photoresist for forming the first sub-pixel units, a material of the photoresist comprises a red, green, blue or yellow pigment and an irreversible thermochromic pigment which is red, blue green or yellow, and the photoresist is capable of being changed into black color upon being heated, wherein a weight percent of the irreversible thermochromic pigment is more than 10 wt % and less than or equal to 25 wt %. ### Claim 13 (depends on 12) A display panel comprising the color filter substrate according to claim 12.