# US 11,029,450 B2 · Substrate with antireflection coating and method for producing same > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,029,450 B2 - Document ID: US11029450B2 - Status: Granted - Kind: B2 - Application number: 16/443,265 - Filed: 2019-06-17 - Published: 2019-10-10 - Granted: 2021-06-08 - Earliest claimed: 2011-02-23 - Assignees: Schott AG - Applicants: Schott AG - Inventors: Christian Henn; Thorsten Damm - Web page: https://patentgrep.com/patent/US11029450B2 ## CPC - G02B 1/116: including electrically conducting layers - C03C 17/3435: {comprising a nitride, oxynitride, boronitride or carbonitride} - C23C 14/08: Oxides (C23C14/10 takes precedence) - C23C 14/185: {by cathodic sputtering} - C23C 14/3485: {using pulsed power to the target} - C23C 14/35: by application of a magnetic field, e.g. magnetron sputtering {(C23C14/3457 takes precedence)} - G02B 1/115: Multilayers - H01J 37/3467: {Pulsed operation, e.g. HIPIMS} - C03C 2217/734: comprising an alternation of high and low refractive indexes - C03C 2217/77: Coatings having a rough surface - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS - C03C: CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract A substrate is provided with an abrasion resistance antireflection coating. The coated substrate includes a multilayer antireflection coating on at least one side. The coating has layers with different refractive indices, wherein higher refractive index layers alternate with lower refractive index layers. The layers having a lower refractive index are formed of silicon oxide with a proportion of aluminum, with a ratio of the amounts of aluminum to silicon is greater than 0.05, preferably greater than 0.08, but with the amount of silicon predominant relative to the amount of aluminum. The layers having a higher refractive index include a silicide, an oxide, or a nitride. ## Claims ### Claim 1 A coated sapphire glass substrate, comprising: a substrate with a first side and a second side; an aluminum-containing silicon dioxide layer on at least one of the first and/or second sides of the substrate; and a multilayer anti-reflection coating on the aluminum-containing silicon oxide layer, wherein the multilayer antireflection coating comprises at least four successive layers and is composed of layers with different refractive indices, wherein layers having a higher refractive index alternate with layers having a lower refractive index, wherein the layers having a lower refractive index are formed of silicon oxide with a proportion of aluminum, and wherein the layers having a higher refractive index are silicon nitride-containing layers, wherein the multilayer anti-reflection coating reduces reflectance of the substrate by more than 3% throughout an entirety of a wavelength range from 400 nm to at least 700 nm. ### Claim 2 (depends on 1) The coated sapphire substrate of claim 1, wherein the at least four successive layers comprises a bottom layer on the aluminum-containing silicon oxide layer that is the higher refractive index layer, a second layer is the lower refractive index layer, and a top layer that is the lower refractive index layer. ### Claim 3 (depends on 1) The coated sapphire substrate of claim 1, wherein the at least four successive layers comprises: an uppermost high refractive index layer with a largest layer thickness among the at least four successive layers; a top layer with a second largest layer thickness among the at least four successive layers; and a bottom layer on the aluminum-containing silicon oxide layer and a second layer on the bottom layer, wherein the bottom and second layers have a combined layer thickness that is thinner than the second largest layer thickness of the top layer. ### Claim 4 (depends on 1) The coated sapphire substrate of claim 1, wherein the layers having the higher refractive index comprise silicon nitride with a proportion of aluminum and a ratio of an amount of aluminum to an amount of silicon that is greater than 0.05. ### Claim 5 (depends on 1) The coated sapphire substrate of claim 1, wherein the layers having the higher refractive index comprise silicon nitride with a proportion of aluminum and a ratio of an amount of aluminum to an amount of silicon that is greater than 0.08. ### Claim 6 (depends on 1) The coated sapphire substrate of claim 1, wherein the multilayer anti-reflection coating has a total coating thickness ranging from 200 to 400 nanometers. ### Claim 7 (depends on 1) The coated sapphire substrate of claim 1, wherein the multilayer anti-reflection coating has a surface with an average roughness and a root mean squared roughness of less than 1.5 nanometers each, based on an area of one square micrometer. ### Claim 8 (depends on 1) The coated sapphire substrate of claim 1, wherein the first side and/or the second side is a curved surface. ### Claim 9 (depends on 1) The coated sapphire substrate of claim 1, wherein the first side and/or the second side is a lenticular surface. ### Claim 10 (depends on 1) The coated sapphire substrate of claim 1, wherein the at least four successive layers consists of four layers. ### Claim 11 (depends on 1) The coated sapphire substrate of claim 1, wherein the at least four successive layers comprises a bottom layer on the aluminum-containing silicon oxide layer with a layer thickness 5 to 40 nanometers, a second layer on the bottom layer with a layer thickness from 10 to 40 nanometers, a second uppermost layer on the second layer with a layer thickness from 100 to 200 nanometers, and a top layer with a layer thickness from 60 to 120 nanometers. ### Claim 12 (depends on 1) The coated sapphire substrate of claim 1, wherein the coated sapphire substrate shows a neutral color impression. ### Claim 13 (depends on 1) The coated sapphire substrate of claim 1, wherein the wavelength range is from 400 nm to 750 nm. ### Claim 14 (depends on 1) The coated sapphire substrate of claim 1, wherein the multilayer anti-reflection coating is a high power impulse magnetron sputtered coating. ### Claim 15 A coated sapphire glass substrate, comprising: a substrate with a first side and a second side; an aluminum-containing silicon dioxide layer on at least one of the first and/or second sides of the substrate; and a multilayer anti-reflection coating on the aluminum-containing silicon oxide layer, wherein the multilayer antireflection coating comprises at least four successive layers and is composed of layers with different refractive indices, wherein layers having a higher refractive index alternate with layers having a lower refractive index, wherein the layers having a lower refractive index are formed of silicon oxide with a proportion of aluminum, and wherein the layers having a higher refractive index are silicon nitride-containing layers, wherein the multilayer anti-reflection coating is a high-power impulse magnetron sputtered coating having an average roughness and a root mean squared roughness of less than 1.5 nanometers each, based on an area of one square micrometer. ### Claim 16 A coated sapphire glass substrate, comprising: a substrate with a first side and a second side; an aluminum-containing silicon dioxide layer on at least one of the first and/or second sides of the substrate; a multilayer anti-reflection coating on the aluminum-containing silicon oxide layer; and a Haze value after a Bayer test increases less than 2.5%, wherein the multilayer antireflection coating comprises at least four successive layers and is composed of layers with different refractive indices, wherein layers having a higher refractive index alternate with layers having a lower refractive index, wherein the layers having the lower refractive index are formed of silicon oxide with a proportion of aluminum, wherein the multilayer anti-reflection coating reduces reflectance of the substrate by more than 3% throughout an entirety of a wavelength range from 400 nm to at least 700 nm, and wherein the layers having the higher refractive index are silicon nitride-containing layers. ### Claim 17 (depends on 16) The coated sapphire glass substrate of claim 16, wherein the Haze value after the Bayer test increases less than 2.0%. ### Claim 18 (depends on 16) The coated sapphire glass substrate of claim 16, wherein the Haze value after the Bayer test increases less than 1.5%. ### Claim 19 (depends on 16) The coated sapphire glass substrate of claim 16, wherein the Haze value after the Bayer test increases less than 0.5%.