# US 11,028,487 B2 · Hard coating and member coated with hard coating

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- Number: US 11,028,487 B2
- Document ID: US11028487B2
- Status: Granted
- Kind: B2
- Application number: 16/344,826
- Filed: 2016-10-25
- Published: 2019-08-15
- Granted: 2021-06-08
- Earliest claimed: 2016-10-25
- Assignees: Osg Corporation
- Applicants: Osg Corporation
- Inventors: Masatoshi Sakurai; Mei Wang
- Web page: https://patentgrep.com/patent/US11028487B2

## CPC

- C23C 30/005: {on hard metal substrates}
- B32B 15/01: all layers being exclusively metallic {(making layered metal workpieces by pressure cladding B23K20/22; making coatings with a metallic material characterised by its composition C23C30/00)}
- C23C 14/06: characterised by the coating material ({C23C14/0021} , C23C14/04 take precedence)
- C23C 14/0641: {Nitrides (C23C14/0617 takes precedence)}
- C23C 14/0664: {Carbonitrides}
- C23C 28/027: {including at least one metal matrix material comprising a mixture of at least two metals or metal phases or metal matrix composites, e.g. metal matrix with embedded inorganic hard particles, CERMET, MMC.}
- C23C 28/044: {coatings specially adapted for cutting tools or wear applications}
- C23C 28/42: {characterized by the composition of the alternating layers}
- C23C 28/44: {characterized by a measurable physical property of the alternating layer or system, e.g. thickness, density, hardness}
- B23B 2228/08: applied by physical vapour deposition [PVD]
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- B32B: LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B23B: TURNING; BORING (arrangements for copying or controlling B23Q)

## Abstract

A hard film for coating a surface of a base material, the hard film includes a layer A, a layer B, and a nanolayer-alternating layer. The layer A is an AlTiCr nitride of (AlaTibCrcαd)N, where α is one or more elements selected from C, B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W. The layer B is an AlTiCr nitride or AlTiCr carbonitride of (AleTifCrgβh)CxN1-X, where β is one or more elements selected from B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W. The nanolayer-alternating layer is formed by alternately laminating a nanolayer A or a nanolayer B having the same composition as the layer A or B. And, the layer C is an AlCr(SiC) nitride or AlCr(SiC) carbonitride of [AliCrj(SiC)kγl]CYN1-Y, where γ is one or more elements selected from B, Ti, V, Y, Zr, Nb, Mo, Hf, Ta, and W.

## Claims

### Claim 1

A hard film for coating a surface of a base material, the hard film configured to include a layer A, a layer B, and a nanolayer-alternating layer alternately laminated by a physical vapor deposition method to a total film thickness of 0.5 to 20 μm, wherein
the layer A is an AlTiCr nitride having a composition formula of (AlaTibCrcαd)N, where α is one or more elements selected from a group consisting of C, B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W and atomic ratios a, b, c, d respectively satisfy 0.10≤a≤0.85, 0.02≤b≤0.70, 0.03≤c≤0.65, 0≤d≤0.10, and a+b+c+d=1, and has a thickness of 0.5 to 1000 nm, wherein
the layer B is an AlTiCr carbonitride having a composition formula of (AleTifCrgβh)CxN1-X, where β is one or more elements selected from a group consisting of B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W and atomic ratios e, f, g, h, and X respectively satisfy 0.10≤e≤0.85, 0.02≤f≤0.70, 0.03≤g≤0.65, 0≤h≤0.10, e+f+g+h=1, and 0≤X≤0.6, and has a thickness of 0.5 to 1000 nm, wherein
the nanolayer-alternating layer is formed by alternately laminating a nanolayer A or a nanolayer B having the same composition as the layer A or the layer B and a layer C and has a thickness of 1 to 1000 nm, wherein
the nanolayer A and the nanolayer B each have a thickness of 0.5 to 500 nm, and wherein
the layer C is an AlCr(SiC) nitride or AlCr(SiC) carbonitride having a composition formula of [AliCrj(SiC)kγl]CYN1-Y, where γ is one or more elements selected from a group consisting of B, Ti, V, Y, Zr, Nb, Mo, Hf, Ta, and W and atomic ratios i, j, k, l, and Y respectively satisfy 0.20≤i≤0.85, 0.05≤j≤0.50, 0.01≤k≤0.45, 0≤l≤0.10, i+j+k+l=1, and 0≤Y≤0.6, and has a thickness of 0.5 to 500 nm.

### Claim 2 (depends on 1)

The hard film according to claim 1, wherein
a value TA/TNL of a ratio between a film thickness TA of the layer A and a film thickness TNL of the nanolayer-alternating layer is 0.2 to 10 while a value TB/TNL of a ratio between a film thickness TB of the layer B and the film thickness TNL of the nanolayer-alternating layer is 0.2 to 10.

### Claim 3 (depends on 1)

The hard film according to claim 1, further including
a surface layer outside the hard film, wherein
the surface layer is made of the same material as the layer A, the layer B, the layer C, or the nanolayer-alternating layer.

### Claim 4 (depends on 1)

The hard film according to claim 1, wherein
the hard film is directly applied to the base material.

### Claim 5 (depends on 1)

The hard film according to claim 1, wherein
the hard film is applied to the base material via an interface layer, and wherein
the interface layer is configured to have a thickness of 20 to 1000 nm and made of the same material as the layer A, the layer B, the layer C, or the nanolayer-alternating layer.

### Claim 6 (depends on 1)

A hard film-coated member partially or entirely coated with the hard film according to claim 1.
