# US 11,028,475 B2 · Method for preventing vacuum pump pipeline from blockage, and chemical vapor deposition machine > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,028,475 B2 - Document ID: US11028475B2 - Status: Granted - Kind: B2 - Application number: 16/316,348 - Filed: 2018-11-14 - Published: 2020-07-02 - Granted: 2021-06-08 - Earliest claimed: 2018-07-04 - Assignees: Hkc Corporation Limited - Applicants: HKC Corporation Limited - Inventors: Jianfeng Shan - Web page: https://patentgrep.com/patent/US11028475B2 ## CPC - C23C 16/4412: {Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps} - C23C 16/4404: {Coatings or surface treatment on the inside of the reaction chamber or on parts thereof} - C23C 16/4408: {by purging residual gases from the reaction chamber or gas lines} - Y02C 20/30: of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6] - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - Y02C: CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG] ## Abstract The present disclosure relates to the technical field of chemical vapor deposition coating equipment, and discloses a method for preventing vacuum pump pipeline from blockage, which includes the following steps: opening a gas source, and introducing reaction gas into a process chamber from the gas source; carrying out a coating reaction of a chemical vapor deposition machine in the process chamber; after coating, closing the gas source, and introducing heated inert gas into an air exhaust pipe connected to an outlet of a vacuum pump; turning on the vacuum pump, and introducing dust and exhaust gas in the process chamber into a exhaust gas treatment device through the air exhaust pipe. The present disclosure also provides a chemical vapor deposition machine applying the method for preventing the vacuum pump pipeline from blockage. ## Claims ### Claim 1 A method for preventing a vacuum pump pipeline from blockage, comprising the following steps: opening a gas source, and introducing reaction gas into a process chamber from the gas source; carrying out a coating reaction of a chemical vapor deposition machine in the process chamber; after coating, closing the gas source, and introducing heated inert gas into an air exhaust pipe connected to an outlet of a vacuum pump; and turning on the vacuum pump, and introducing dust and exhaust gas in the process chamber into a exhaust gas treatment device through the air exhaust pipe. ### Claim 2 (depends on 1) The method according to claim 1, wherein after introducing heated inert gas into the air exhaust pipe, the method further comprises an operation of heat preservation of the air exhaust pipe. ### Claim 3 (depends on 1) The method according to claim 1, wherein after the coating and before turning on the vacuum pump, the method further comprises an operation of heating an air inlet pipe connected to an air inlet of the vacuum pump. ### Claim 4 (depends on 1) The method according to claim 1, further comprising plating a coating layer for preventing dust adhesion on an inner wall of the air exhaust pipe to reduce an adhesion probability of powder on the inner wall of the air exhaust pipe. ### Claim 5 (depends on 2) The method according to claim 2, further comprising plating a coating layer for preventing dust adhesion on an inner wall of the air exhaust pipe to reduce an adhesion probability of powder on the inner wall of the air exhaust pipe. ### Claim 6 (depends on 3) The method according to claim 3, further comprising plating a coating layer for preventing dust adhesion on an inner wall of the air exhaust pipe to reduce an adhesion probability of powder on the inner wall of the air exhaust pipe. ### Claim 7 A chemical vapor deposition machine, comprising a vacuum pump, a process chamber, and an exhaust gas treatment device, an air inlet pipe being connected with the vacuum pump and the process chamber therebetween, and an air exhaust pipe being connected with the exhaust gas treatment device and the vacuum pump therebetween, wherein, one end of the air exhaust pipe near the vacuum pump communicates with a gas tube which is configured to fill inert gas into the air exhaust pipe, the gas tube defines a first heating device, and the chemical vapor deposition machine is defined to prevent the vacuum pump pipe from blockage, comprising the following operations: opening a gas source, and introducing reaction gas into the process chamber from the gas source; carrying out a coating reaction of the chemical vapor deposition machine in the process chamber; after coating, closing the gas source, and introducing heated inert gas into the air exhaust pipe connected to an outlet of the vacuum pump; and turning on the vacuum pump, and introducing dust and exhaust gas in the process chamber into a exhaust gas treatment device through the air exhaust pipe. ### Claim 8 (depends on 7) The chemical vapor deposition machine according to claim 7, wherein the chemical vapor deposition machine is defined to prevent a vacuum pump pipeline from blockage, further comprising an operation of heat preserving the air exhaust pipe after introducing heated inert gas into the air exhaust pipe. ### Claim 9 (depends on 8) The chemical vapor deposition machine according to claim 8, wherein the chemical vapor deposition machine is defined to prevent a vacuum pump pipeline from blockage, further comprising an operation of plating a coating layer for preventing dust adhesion on an inner wall of the air exhaust pipe to reduce an adhesion probability of powder on the inner wall of the air exhaust pipe. ### Claim 10 (depends on 7) The chemical vapor deposition machine according to claim 7, wherein the chemical vapor deposition machine is defined to prevent a vacuum pump pipeline from blockage, further comprising after coating and before turning on the vacuum pump an operation of heating the air inlet pipe connected to an air inlet of the vacuum pump. ### Claim 11 (depends on 10) The chemical vapor deposition machine according to claim 10, wherein the chemical vapor deposition machine is defined to prevent a vacuum pump pipeline from blockage, further comprising an operation of plating a coating layer for preventing dust adhesion on an inner wall of the air exhaust pipe to reduce an adhesion probability of powder on the inner wall of the air exhaust pipe. ### Claim 12 (depends on 7) The chemical vapor deposition machine according to claim 7, further comprising plating a coating layer for preventing dust adhesion on an inner wall of the air exhaust pipe to reduce an adhesion probability of powder on the inner wall of the air exhaust pipe. ### Claim 13 (depends on 7) The chemical vapor deposition machine according to claim 7, wherein the air exhaust pipe defines a heat preservation device. ### Claim 14 (depends on 7) The chemical vapor deposition machine according to claim 7, further comprising a second heating device arranged at one end of the air inlet pipe near the vacuum pump and/or a third heating device arranged at one end of the air exhaust pipe near the vacuum pump. ### Claim 15 (depends on 7) The chemical vapor deposition machine according to claim 7, wherein at least an inner side wall of an air inlet of the air exhaust pipe defines a coating layer for preventing dust adhesion. ### Claim 16 (depends on 15) The chemical vapor deposition machine according to claim 15, wherein the coating layer for preventing dust adhesion is a polytetrafluoroethylene layer. ### Claim 17 A chemical vapor deposition machine, comprising a vacuum pump, a process chamber, and an exhaust gas treatment device, an air inlet pipe being connected with the vacuum pump and the process chamber therebetween, and an air exhaust pipe being connected with the exhaust gas treatment device and the vacuum pump therebetween, wherein, the chemical vapor deposition machine further comprises: a coating layer, defined on inner side walls of the air inlet pipe and the air exhaust pipe and configured to prevent dust adhesion; a gas tube, communicated with one end of the air exhaust pipe near the vacuum pump and configured to introduce inert gas into the air exhaust pipe; a first heating device, defined on the gas tube and configured to heat inert gas introduced into the gas tube; and a heat preservation device, defined on the air exhaust pipe and configured to perform heat preservation of an environment in the air exhaust pipe.