# US 11,028,201 B2 · Polymer composition > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,028,201 B2 - Document ID: US11028201B2 - Status: Granted - Kind: B2 - Application number: 16/465,357 - Filed: 2017-11-29 - Published: 2019-09-26 - Granted: 2021-06-08 - Earliest claimed: 2016-11-30 - Assignees: LG Chem, Ltd. - Applicants: LG Chem, Ltd. - Inventors: Se Jin Ku; Mi Sook Lee; Hyung Ju Ryu; Sung Soo Yoon; No Jin Park; Jung Keun Kim; Je Gwon Lee; Eun Young Choi - Web page: https://patentgrep.com/patent/US11028201B2 ## CPC - C08F 293/005: {using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent} - C08F 212/08: Styrene - C08F 220/22: Esters containing halogen - C08F 228/02: by a bond to sulfur - C08L 53/005: {Modified block copolymers} - C09D 153/00: Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers - G03F 1/00: Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof - G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping} - C08F 2438/03: Use of a di- or tri-thiocarbonylthio compound, e.g. di- or tri-thioester, di- or tri-thiocarbamate, or a xanthate as chain transfer agent, e.g . Reversible Addition Fragmentation chain Transfer [RAFT] or Macromolecular Design via Interchange of Xanthates [MADIX] - H10P 50/28: of insulating materials - H10P 76/00: Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography - C08F: MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS - C08L: COMPOSITIONS OF MACROMOLECULAR COMPOUNDS (compositions based on polymerisable monomers C08F, C08G; artificial filaments or fibres D01F; textile treating compositions D06) - C09D: COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics A61K; processes for applying liquids or other fluent materials to surfaces, in general, B05D; staining wood B27K5/02; glazes or vitreous enamels C03C; natural resins, French polish, drying-oils, driers, turpentine, per se, C09F; polishing compositions other than French polish, ski waxes C09G; adhesives or use of materials as adhesives C09J; materials for sealing or packing joints or covers C09K3/10; materials for stopping leaks C09K3/12; processes for the electrolytic or electrophoretic production of coatings C25D) - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract A polymer composition, methods and a use thereof are disclosed herein. The polymer composition having excellent self-assembly properties and capable of forming a vertical orientation structure even on a surface that no neutral treatment is performed, where the vertically oriented self-assembled structure can be effectively formed in a short time. ## Claims ### Claim 1 A polymer composition, comprising: a first block copolymer having a polymer segment A and a polymer segment B; and a second block copolymer having a polymer segment C and a polymer segment D, wherein the second block copolymer having a number average molecular weight (M2) lower than a number average molecular weight (M1) of the first block copolymer, wherein the polymer segments A and C each comprise a side chain having 8 or more chain-forming atoms. ### Claim 2 (depends on 1) The polymer composition according to claim 1, wherein a ratio of M1 to M2 is in a range of 1.05 to 10. ### Claim 3 (depends on 2) The polymer composition according to claim 2, wherein M1 is in a range of 30 to 150 Kg/mol. ### Claim 4 (depends on 2) The polymer composition according to claim 2, wherein M2 is in a range of 10 to 80 Kg/mol. ### Claim 5 (depends on 1) The polymer composition according to claim 1, wherein a difference between M1 and M2 is less than 100 kg/mol. ### Claim 6 (depends on 1) The polymer composition according to claim 1, wherein the second block copolymer in the polymer composition has the lowest number average molecular weight and the second block copolymer has a weight ratio in a range of 25% to 90%, based on the total weight of all the block copolymers in the polymer composition. ### Claim 7 (depends on 1) The polymer composition according to claim 1, wherein the second block copolymer in the polymer composition has the lowest number average molecular weight, and the second block copolymer has a molar ratio in a range of 40% to 90%, based on the total mole number of all the block copolymers in the polymer composition. ### Claim 8 (depends on 1) The polymer composition according to claim 1, wherein the polymer segments A and C each have a side chain and exhibit an X-ray diffraction peak having a half-height width in a range of 0.2 to 1.5 nm−1 in a scattering vector range of 0.5 to 10 nm−1. ### Claim 9 (depends on 1) The polymer composition according to claim 1, wherein the absolute value of the difference in surface energy of the polymer segments A and B and the absolute value of the difference in surface energy of the polymer segment C and D are each in a range of 2.5 to 7 mN/m. ### Claim 10 (depends on 1) The polymer composition according to claim 1, wherein the sum of volume fractions of the polymer segments A and C is in a range of 0.3 to 0.6, and the sum of volume fractions of the polymer segments A, B, C and D is 1. ### Claim 11 (depends on 1) The polymer composition according to claim 1, wherein the polymer segments A and C each comprise a ring structure and the side chain is substituted on the ring structure. ### Claim 12 (depends on 1) The polymer composition according to claim 1, wherein the polymer segments B and D each comprise three or more halogen atoms. ### Claim 13 (depends on 12) The polymer composition according to claim 12, wherein the polymer segments B and D each comprise a ring structure and the halogen atoms are substituted on the ring structure. ### Claim 14 (depends on 1) A laminate, comprising: a substrate; and a polymer film in contact with the substrate, wherein the polymer film comprises the polymer composition of claim 1, wherein the first and second block copolymers form a self-assembled structure in the polymer film, and wherein the surface of the substrate that the polymer film contacts is not subjected to neutral treatment prior to contact with the polymer film. ### Claim 15 (depends on 14) The laminate according to claim 14, wherein the self-assembled structure is vertically oriented. ### Claim 16 (depends on 14) A method for producing a patterned substrate, comprising: selectively removing any one polymer segment from the block copolymers forming the self-assembled structure in the polymer film of the laminate of claim 14 to expose a surface of the substrate, the exposed surface of the substrate underlying the portion of the polymer film that is removed. ### Claim 17 (depends on 16) The method for producing a patterned substrate according to claim 16, further comprising: etching the exposed surface of the substrate using the polymer film as a mask. ### Claim 18 A polymer composition, comprising: a first block copolymer having a polymer segment A and a polymer segment B; and a second block copolymer having a polymer segment C and a polymer segment D, wherein the second block copolymer having a number average molecular weight (M2) lower than a number average molecular weight (M1) of the first block copolymer, wherein the polymer segments A and C each have a side chain and exhibit an X-ray diffraction peak having a half-height width in a range of 0.2 to 1.5 nm−1 in a scattering vector range of 0.5 to 10 nm−1. ### Claim 19 A polymer composition, comprising: a first block copolymer having a polymer segment A and a polymer segment B; and a second block copolymer having a polymer segment C and a polymer segment D, wherein the second block copolymer having a number average molecular weight (M2) lower than a number average molecular weight (M1) of the first block copolymer, wherein the absolute value of the difference in surface energy of the polymer segments A and B and the absolute value of the difference in surface energy of the polymer segment C and D are each in a range of 2.5 to 7 mN/m.