# US 11,028,005 B2 · Glass for semiconductor processing

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- Number: US 11,028,005 B2
- Document ID: US11028005B2
- Status: Granted
- Kind: B2
- Application number: 17/006,271
- Filed: 2020-08-28
- Published: 2021-01-28
- Granted: 2021-06-08
- Earliest claimed: 2019-07-23
- Assignees: AGC Inc.
- Applicants: AGC Inc.
- Inventors: Seiji Inaba; Kazutaka Ono
- Web page: https://patentgrep.com/patent/US11028005B2

## CPC

- C03C 3/068: containing rare earths
- H10P 72/74: {using temporarily an auxiliary support}
- H10P 72/7436: {used to support a device or a wafer when forming electrical connections thereto}
- H10P 72/7442: {Separation by peeling}
- C03C: CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

To provide a glass plate having a high Young's modulus and a high devitrification viscosity. A glass includes, in mol % based on oxides: SiO2 of 30.0 to 50.0%; B2O3 of 10.0 to 30.0%; Al2O3 of 10.0 to 30.0%; Y2O3 of 3.0 to 17.0%; and Gd2O3 of 3.5 to 17.0%, in which (Gd2O3+Y2O3) is from 16.0 to 22.0%, and (Gd2O3/Y2O3) is from 0.15 to 7.0.

## Claims

### Claim 1

A glass comprising, in mol % based on oxides:
SiO2 of 30.0 to 50.0%;
B2O3 of 10.0 to 30.0%;
Al2O3 of 10.0 to 30.0%;
Y2O3 of 3.0 to 17.0%; and
Gd2O3 of 3.5 to 17.0%, wherein:
(Gd2O3+Y2O3) is from 16.0 to 22.0%;
(Gd2O3/Y2O3) is from 0.15 to 7.0;
the glass has a modulus of equal to or larger than 110 GPa; and
the glass has a devitrification viscosity log η of equal to or larger than 1.95.

### Claim 2 (depends on 1)

The glass according to claim 1, wherein the glass includes, in mol % based on oxides:
SiO2 of 35.0 to 45.0%;
B2O3 of 15.0 to 25.0%;
Al2O3 of 15.0 to 25.0%;
Y2O3 of 9.0 to 14.0%; and
Gd2O3 of 6.0 to 11.0%.

### Claim 3 (depends on 1)

The glass according to claim 1, wherein, in mol % based on oxides,
(Gd2O3+Y2O3) is from 19.0 to 21.0%, and
(Gd2O3/Y2O3) is from 0.5 to 2.0.

### Claim 4 (depends on 1)

The glass according to claim 1, wherein, in mol % based on oxides, 95.0%≤(SiO2+B2O3+Al2O3+Y2O3+Gd2O3)≤100.0%.

### Claim 5 (depends on 1)

The glass according to claim 1, wherein the devitrification viscosity log η is equal to or larger than 2.00.

### Claim 6 (depends on 1)

The glass according to claim 1, wherein the glass is used as a support substrate of a semiconductor.

### Claim 7 (depends on 1)

The glass according to claim 1, wherein the glass is used as a peelable support substrate in a semiconductor manufacturing process.