# US 11,027,990 B2 · Plasma-based methods and systems for treating waters with high electrical conductivity and/or low surface tension > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,027,990 B2 - Document ID: US11027990B2 - Status: Granted - Kind: B2 - Application number: 15/987,504 - Filed: 2018-05-23 - Published: 2018-11-29 - Granted: 2021-06-08 - Earliest claimed: 2017-05-24 - Assignees: Clarkson University - Applicants: Selma Mededovic; Thomas Holsen - Inventors: Selma Mededovic; Thomas Holsen - Web page: https://patentgrep.com/patent/US11027990B2 ## CPC - C02F 1/4608: {using electrical discharges} - H01J 37/32449: {Gas control, e.g. control of the gas flow} - H01J 37/32458: {Vessel} - C02F 2101/301: {Detergents, surfactants} - C02F 2201/4619: Supplying gas to the electrolyte - C02F 2305/023: Reactive oxygen species, singlet oxygen, OH radical - C02F: TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE (separation in general B01D; special arrangements on waterborne vessels of installations for treating water, waste water or sewage, e.g. for producing fresh water, B63J; adding materials to water to prevent corrosion C23F; treating radioactively-contaminated liquids G21F9/04; regeneration of reactants for recirculation into processes, see the relevant places for the processes) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract An electrical discharge plasma reactor system for treating a liquid, the reactor system including: a reactor chamber configured to hold the liquid and a gas; a discharge electrode disposed within the reactor chamber, wherein the discharge electrode is disposed within the gas; an opposing electrode disposed within the gas within the reactor chamber; one or more gas diffusers disposed within the liquid, wherein the one or more gas diffusers is configured to induce the generation of a layer of foam on a surface of the liquid in a plasma-contact region; and a power supply connected to the discharge electrode and/or the opposing electrode, the power supply configured to induce the discharge electrode and the opposing electrode to generate plasma in the plasma-contact region. ## Claims ### Claim 1 An electrical discharge plasma reactor system for treating a liquid, the reactor system comprising: a reactor chamber configured to hold the liquid and a gas; a discharge electrode disposed within the reactor chamber, wherein the discharge electrode is disposed within the gas; an opposing electrode disposed within the gas within the reactor chamber; one or more gas diffusers disposed within the liquid, wherein the one or more gas diffusers is configured to induce the generation of a layer of foam on a surface of the liquid in a plasma-contact region; wherein the one or more gas diffusers are connected to the reactor chamber beneath the liquid, which is between the one or more gas diffusers and the gas; and a power supply connected to the discharge electrode and/or the opposing electrode, the power supply configured to induce the discharge electrode and the opposing electrode to generate plasma in the plasma-contact region. ### Claim 2 (depends on 1) The system of claim 1, wherein the discharge electrode and the opposing electrode are separated by a distance such that the plasma generated forms a continuous spark that contacts the surface of the liquid as it spans the distance between the electrodes. ### Claim 3 (depends on 1) The system of claim 1, wherein the one or more gas diffusers comprises a plurality of gas diffusers and each gas diffuser has a different gas flowrate to induce the generation of foam on the surface of the liquid. ### Claim 4 (depends on 1) The system of claim 1, wherein the discharge electrode and the opposing electrode are separated by a distance such that the plasma generated forms distinct discharges that contact the surface of the liquid. ### Claim 5 An electrical discharge plasma reactor system for treating a liquid, the reactor system comprising: a reactor chamber configured to hold the liquid and a gas; a discharge electrode disposed within the reactor chamber, wherein the discharge electrode is disposed within the gas; an opposing electrode disposed within the gas within the reactor chamber; one or more gas diffusers disposed within the liquid, wherein the one or more gas diffusers is configured to induce the generation of a layer of foam on a surface of the liquid in a plasma-contact region; wherein the one or more gas diffusers are connected to the reactor chamber beneath the liquid, which is between the one or more gas diffusers and the gas; and a power supply connected to the discharge electrode and/or the opposing electrode, the power supply configured to induce the discharge electrode and the opposing electrode to generate plasma in a plasma-contact region; wherein the discharge electrode and the opposing electrode are separated by a distance such that the plasma generated forms a continuous spark that contacts a surface of the liquid as it spans the distance between the electrodes. ### Claim 6 (depends on 5) The system of claim 5, further comprising a weir configured to obstruct electrolytic conduction through the liquid in a region between the discharge electrode and opposing electrode. ### Claim 7 (depends on 5) The system of claim 5, wherein each gas diffuser of the one or more gas diffusers has a different gas flowrate. ### Claim 8 A method for treating a liquid, the method comprising the steps of: providing an electrical discharge plasma reactor including a reactor chamber configured to hold the liquid and a gas; positioning a discharge electrode in the reactor chamber above a surface of the liquid; positioning an opposing electrode in the reactor chamber above the surface of the liquid, wherein the opposing electrode is separated from the discharge electrode by an interelectrode gap; delivering voltage to at least the discharge electrode and inducing the discharge electrode and the opposing electrode to generate plasma in a plasma-contact region on the surface of the liquid to degrade at least one component dissolved within the liquid; and generating foam in the plasma-contact region on the surface of the liquid. ### Claim 9 (depends on 8) The method of claim 8, further comprising the step of bubbling gas through a diffuser to generate the foam on the surface of the liquid. ### Claim 10 (depends on 9) The method of claim 9, wherein the diffuser is arranged at least partially within the liquid and beneath the surface of the liquid. ### Claim 11 (depends on 8) The method of claim 8, further comprising the step of generating a continuous spark that spans the inter-electrode gap between the discharge electrode and the opposing electrode, wherein the continuous spark contacts the surface of the liquid. ### Claim 12 (depends on 8) The method of claim 8, further comprising the step of generating discrete plasma discharges from the discharge electrode and the opposing electrode, each contacting the surface of the liquid. ### Claim 13 (depends on 12) The method of claim 12, further comprising the step of positioning an obstructive weir within the liquid between the discharge electrode and the opposing electrode to form a continuous spark. ### Claim 14 (depends on 8) The method of claim 8, further comprising the step of bubbling gas through first and second diffusers to generate the foam on the surface of the liquid, wherein the first and second diffusers have different gas flowrates. ### Claim 15 (depends on 14) The method of claim 14, wherein the gas flowrates of the first and second diffusers depend on where each diffuser is located within the reactor. ### Claim 16 (depends on 8) The method of claim 8, wherein each of the discharge electrode and the opposing electrode is arranged a distance from the surface of the liquid and the distance is smaller than the inter-electrode gap. ### Claim 17 (depends on 8) The method of claim 8, wherein the inter-electrode gap depends on a conductivity of the liquid. ### Claim 18 (depends on 8) The method of claim 8, wherein the discharge electrode and the opposing electrode are at least partially disposed within the gas of the reactor chamber.