# US 11,027,526 B2 · Reflective glazing comprising a thin layer of silicon-rich silicon nitride

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- Number: US 11,027,526 B2
- Document ID: US11027526B2
- Status: Granted
- Kind: B2
- Application number: 16/603,884
- Filed: 2018-04-12
- Published: 2020-04-16
- Granted: 2021-06-08
- Earliest claimed: 2017-04-12
- Assignees: Saint-Gobain Glass France
- Applicants: Saint-Gobain Glass France
- Inventors: Nisita Wanakule; Rosiana Aguiar; Estelle Martin; Jean Carlos Lorenzzi
- Web page: https://patentgrep.com/patent/US11027526B2

## CPC

- B32B 17/10201: {Dielectric coatings}
- C03C 17/225: {Nitrides}
- C03C 17/3435: {comprising a nitride, oxynitride, boronitride or carbonitride}
- C03C 2217/281: Nitrides
- C03C 2218/155: by reactive sputtering
- C03C 2218/156: by magnetron sputtering
- Y10T 428/2495: Thickness [relative or absolute]
- B32B: LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- C03C: CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

A glass article includes at least one glass substrate on which a stack of layers is deposited. The stack includes at least one layer consisting of a layer of silicon nitride of formulation SiNx, in which x is less than 1.25. The physical thickness of the SiNx layer is between 5 and 50 nm. The light reflection of the glass article, measured on the side of the substrate on which the stack is deposited, is greater than 20%.

## Claims

### Claim 1

A glass article, comprising:
a glass substrate on which a stack of layers is deposited,
wherein the stack comprises a layer comprising silicon nitride of a formulation SiNx, in which x is less than 1.25, as an SiNx layer,
wherein a physical thickness of the SiNx layer is in a range of from 5 to 50 nm,
wherein the glass article has a light reflection, measured on a side of the substrate on which the stack is deposited, greater than 35%, and
wherein the stack does not comprise a layer based on silver.

### Claim 2 (depends on 1)

The article of claim 1, wherein x is less than 1.00.

### Claim 3 (depends on 2)

The article of claim 2, wherein the light reflection of the glass article, measured on the stack side, is greater than 40%.

### Claim 4 (depends on 1)

The article of claim 1, wherein the stack comprises the SiNx layer and a layer comprising a dielectric material.

### Claim 5 (depends on 4)

The article of claim 4, wherein the layer(s) of dielectric material comprise silicon nitride, aluminum nitride, tin oxide, a mixed zinc tin oxide, a silicon oxide, a titanium oxide, and/or silicon oxynitride SiOxNy.

### Claim 6 (depends on 4)

The article of claim 4, wherein the layer(s) of dielectric material comprise silicon nitride doped with Al, Zr, and/or B, an aluminum nitride, tin oxide, a mixed zinc tin oxide, a silicon oxide, a titanium oxide, and/or silicon oxynitride SiOxNy.

### Claim 7 (depends on 1)

The article of claim 1, wherein the stack comprises the SiNx is layer and an overlayer comprising a dielectric material.

### Claim 8 (depends on 7)

The article of claim 7, wherein the dielectric material comprises an oxide, nitride, and/or oxynitride.

### Claim 9 (depends on 1)

The article of claim 1, wherein the stack comprises a sequence of layers as follows, starting from a deposition surface of the glass substrate:
the SiNx layer; and
an overlayer comprising a dielectric material,
wherein, in total, all layer(s) have a physical thickness in a range of from 5 to 50 nm.

### Claim 10 (depends on 1)

The article of claim 1, wherein the stack comprises a sequence of layers as follows, starting from a deposition surface of the glass substrate:
the SiNx layer; and
an upper overlayer with a thickness in a range of from 5 to 30 nm of silicon nitride.

### Claim 11 (depends on 10)

The article of claim 10, further comprising:
a titanium oxide overlayer.

### Claim 12 (depends on 1)

The article of claim 1, wherein the stack does not comprise metal layers having reflection properties in the infrared region.

### Claim 13 (depends on 1)

The article of claim 1, wherein the stack does not comprise layers based on gold, and
wherein the stack does not comprise a layer based on copper.

### Claim 14 (depends on 1)

The article of claim 1, wherein the Si/N concentration varies in the thickness of the SiNx layer.

### Claim 15 (depends on 1)

The article of claim 1, wherein the stack comprises a sequence of layers as follows, starting from a deposition surface of the glass substrate:
an underlayer, comprising a dielectric material, with a total physical thickness in a range of from 5 to 50 nm;
the SiNx layer; and
an overlayer, comprising a dielectric material,
wherein, in total, all laver(s) have a physical thickness in a range of from 5 to 50 nm.

### Claim 16 (depends on 1)

The article of claim 1, wherein the stack comprises a sequence of layers as follows, starting from a deposition surface of the glass substrate:
an underlayer comprising a dielectric material;
the silicon nitride layer of formulation SiNx;
an upper overlayer with a thickness in a range of from 5 to 30 nm of silicon nitride doped with Al, Zr, and/or B.

### Claim 17 (depends on 1)

The article of claim 1, wherein the stack consists of the silicon nitride layer and one or more layers of dielectric materials, and/or
wherein x in the SiNx layer is less than 0.8.

### Claim 18 (depends on 1)

The article of claim 1, configured as a building glazing.

### Claim 19 (depends on 1)

The article of claim 1, configured as a motor vehicle glazing.

### Claim 20 (depends on 1)

An oven door or article suitable for protection of an oven, the door or article comprising:
the glass article of claim 1.