Systems and methods for priming fluid circuits of a plasma processing system

A method of priming a plasma processing system comprising at least a first fluid flow path, the method comprising:

• using a first fluid, flushing the first fluid flow path, wherein the first fluid flow path is defined by a source of the first fluid, a first valve positioned between the source of the first fluid and a first fluid flow line, a second valve positioned between the first fluid flow line and a second fluid flow line, a first pump positioned between the second fluid flow line and a third fluid flow line, and a prime waste container in fluid communication with the third fluid flow line;
• closing the second valve, thereby preventing a flow of the second fluid to the second fluid flow line, the third fluid flow line, and the prime waste container;
• closing the first valve, thereby preventing a flow of the first fluid to the first fluid flow line from the source of the first fluid;
• opening a third valve, wherein the third valve is positioned between the first fluid flow line, and a fourth fluid flow line, wherein the third valve and the fourth fluid flow line are components of the plasma processing system;
• opening a fourth valve, wherein the fourth valve is positioned between a source of a second fluid and the first fluid flow line, thereby enabling a flow of the second fluid from the source of second fluid to the first fluid flow line and the fourth fluid flow line and wherein the fourth valve and the source of the second fluid are components of the plasma processing system;
• and
• closing the third valve and opening the second valve and a fifth valve, thereby enabling a flow of fluid from the source of second fluid to the first fluid flow line, the second fluid flow line, the third fluid flow line and the prime waste container, wherein the fifth valve is positioned between the second fluid flow line and the third fluid flow line.