Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound

A chemically amplified positive-type photosensitive resin composition comprising:

• an acid generator (A) which generates acid upon exposure to an irradiated active ray or radiation;
• a resin (B) whose solubility in alkali increases under the action of acid;
• and
• a mercapto compound (C) represented by the following formula (C1-1):
• wherein Rc1s each independently represent a hydrogen atom, a hydrocarbon group or an acid dissociable group, n1 is an integer of 1 or more and 4 or less, n2 is 1 or 2, at least one of Rc1 is a hydrogen atom or an acid dissociable group, and Ac is an (n1+n2)-valent aliphatic cyclic group which optionally has one or more substituents and optionally includes one or more heteroatoms, or is represented by the following formula (C1-4):
• wherein Rc1s each independently represent a hydrogen atom, a hydrocarbon group or an acid dissociable group, n1 is an integer of 1 or more and 4 or less, n2 is 1 or 2, at least one of Rc1 is a hydrogen atom or an acid dissociable group, Xc1 is an (n1+1)-valent nitrogen-containing heterocyclic group, and Xc2 is a single bond or an optionally substituted (n2+1)-valent hydrocarbon group.