Substrate processing apparatus and substrate processing method

A method for dispensing liquid on a substrate, comprising:

• providing a substrate on a pedestal;
• probing a temperature of the substrate and calculating a temperature difference between the temperature of the substrate and a predetermined temperature;
• dispensing a liquid accumulating in a center region of a top surface of the substrate;
• determining a rotational speed according to the temperature difference subsequent to a beginning of dispensing the liquid on the substrate, wherein the determining the rotational speed of the pedestal comprises:
• when the temperature of the substrate is determined to be greater than the predetermined temperature, generate a positive rotational speed difference proportional to a difference between the temperature of the substrate and the predetermined temperature;
• applying the rotational speed difference on the pedestal to achieve a spreading speed subsequent to dispensing the liquid on the substrate, wherein applying the rotational speed difference is performed prior to the liquid being spread over the entire top surface of the substrate;
• and
• applying a liquid drying speed to the pedestal subsequent to spreading the liquid over the entire top surface of the substrate, wherein the liquid drying speed is greater than the spreading speed.

A method for processing a substrate, comprising:

• applying a first rotational speed on the pedestal, the pedestal is configured to support the substrate;
• probing a temperature of the pedestal;
• calculating a temperature difference between the temperature of the pedestal and a predetermined temperature;
• dispensing a liquid accumulating in a center region of a top surface of the substrate;
• determining a second rotational speed according to the temperature difference by a controller subsequent to a beginning of dispensing the liquid on the substrate, wherein the determining the rotational speed of the pedestal comprises:
• when the temperature of the pedestal is determined to be greater than the predetermined temperature, generate a positive rotational speed difference proportional to a difference between the temperature of the pedestal and the predetermined temperature;
• and
• applying the second rotational speed on the pedestal by changing the first rotational speed to the second rotational speed subsequent to dispensing the liquid on the substrate, wherein applying the second rotational speed is performed prior to the liquid being spread over the entire top surface of the substrate;
• applying a liquid drying speed to the pedestal subsequent to spreading the liquid over the entire top surface of the substrate, wherein the liquid drying speed is greater than the second rotational speed.