Roll to roll fabrication apparatus for preventing thermal impact

A roll to roll fabrication apparatus performing a plurality of processes through a single roll to roll fabrication process, comprising:

• a vacuum chamber having an installation chamber and a process chamber, wherein the installation chamber is configured to preprocess a film and the process chamber is configured to process the film after the preprocessing by the installation chamber, the film having a first surface and a second surface that is opposite of the first surface, and wherein the installation chamber includes an inlet where the film processed in a previous process is transferred and an outlet where the film processed in a current process is transferred to a next process region;
• an opening installed between the installation chamber and the process chamber;
• a preprocessing device arranged in the installation chamber, the preprocessing device having a plasma gas injection plate and a plurality of injection openings in the plasma gas injection plate, the preprocessing device configured to inject plasma gas on the first surface of the film via the plurality of injection openings to remove foreign materials on the first surface of the film to be transferred, wherein the injection openings have a selected pitch therebetween along a first direction of the plasma gas injection plate and a second direction of the plasma gas injection plate that is transverse to the first direction;
• a process drum in the process chamber to wind the film thereon;
• a gas supply configured to inject gas through a gas supplying pipe in the process chamber, the gas supply being configured to form the gas in a plasma state and perform a chemical vapor deposition process on the film wound on the process drum based on the plasma state of the gas;
• a first vacuum pump and a second vacuum pump arranged at the installation chamber and the process chamber, respectively,
• wherein the plasma gas flows to the first vacuum pump from a first gas inlet within the installation chamber, and the preprocessing device is arranged near the first gas inlet, such that the plasma gas is prevented from being introduced into the process chamber, and
• wherein the opening is configured to prevent the plasma gas from entering the process chamber and to maintain separate vacuum levels to be obtained in the installation chamber and the process chamber;
• at least one first heater in the installation chamber, wherein the first heater gradually increases a temperature of the film to within a first range;
• at least one second heater, which is disposed in the process chamber and between the at least one first heater and the process drum, wherein the second heater gradually increases the temperature of the film from within the first range to within a second range higher than the first range,
• wherein the preprocessing device further includes:
• guide bars attached to the installation chamber and disposed at both sides of a transfer path of the film which is transferred by guide rolls;
• and
• a supporting plate disposed above the film and coupled to the guide bars;
• wherein the plasma gas injection plate is attached to the supporting plate, and configured to process the film by turning gas injected into the film into a plasma state and then by injecting the plasma gas;
• and
• a gas supplying pipe is connected to the first gas inlet formed at the installation chamber and configured to inject gas into the plasma gas injection plate.