Process chamber for field guided exposure and method for implementing the process chamber
AssigneeApplied Materials, Inc.
InventorsKartik Ramaswamy, Srinivas D. Nemani
Life of this patent
Estimating the term…
Abstract
A method and apparatus disclosed herein apply to processing a substrate, and more specifically to a method and apparatus for improving photolithography processes. The apparatus includes a chamber body, a substrate support disposed within the chamber body, and an electrode assembly. The substrate support has a top plate disposed above the substrate support, a bottom plate disposed below the substrate support, and a plurality of electrodes connecting the top plate to the bottom plate. A voltage is applied to the plurality of electrodes to generate an electric field. Methods for exposing a photoresist layer on a substrate to an electric field are also disclosed herein.
Claims20
A processing chamber comprising:
- a chamber body;
- a substrate support disposed in the chamber body;
- and
- an electrode assembly, the electrode assembly comprising:
- a top plate disposed above the substrate support;
- a bottom plate disposed below the substrate support;
- and
- a plurality of electrodes connecting the top plate to the bottom plate, the electrodes operable, upon application of a voltage thereto, to generate an electric field, wherein the plurality of electrodes are displaced vertically to electrically connect and disconnect the top plate to the bottom plate and are configured to split and move vertically to electrically connect and disconnect the top plate to the bottom plate.
A processing chamber comprising:
- a chamber body;
- a substrate support disposed in the chamber body;
- and
- an electrode assembly disposed in a processing volume defined by the chamber body, the electrode assembly comprising:
- a top plate disposed above the substrate support;
- a bottom plate disposed below the substrate support;
- and
- a plurality of electrodes connecting the top plate to the bottom plate, each electrode in the plurality of electrodes having a first end and a second end, the first end contacting the top plate and the second end contacting the bottom plate, the electrodes operable, upon application of a voltage thereto, to generate an electric field directly above and parallel to the substrate support, wherein the plurality of electrodes are displaced vertically to electrically connect and disconnect the top plate to the bottom plate and are configured to split and move vertically to electrically connect and disconnect the top plate to the bottom plate.
A processing chamber comprising:
- a chamber body;
- a substrate support disposed in the chamber body;
- and
- an electrode assembly, the electrode assembly comprising:
- a top plate disposed above the substrate support;
- a bottom plate disposed below the substrate support;
- and
- a plurality of electrodes connecting the top plate to the bottom plate, the electrodes operable, upon application of a voltage thereto, to generate an electric field, the plurality of electrodes comprising at least one stationary electrode and at least one opening electrode, wherein the at least one opening electrode of the plurality of electrodes is displaced vertically to electrically connect and disconnect the top plate to the bottom plate and are configured to split and move vertically to electrically connect and disconnect the top plate to the bottom plate.
Dependencies are inferred from the claim text.