Substrate coating apparatus for floating substrate and method

A coating apparatus comprising:

• a stationary stage which extends along a main scanning direction and has an upper surface covered by a plurality of gas supply ports which lifts a substrate to float at a predetermined height by using a pressurized gas;
• a droplet discharger which includes a plurality of discharge heads and drops a droplet of a functional liquid on the substrate lifted to the predetermined height from the stationary stage;
• a main scanning direction mover including a main scanning direction guide which extends in the main scanning direction, multiple main scanning direction sliders which are directly attached to and moved along the main scanning direction guide, and a substrate holder mounted on each of the multiple main scanning direction sliders and configured to hold the substrate;
• and
• a sub-scanning direction mover which moves the droplet discharger in a sub-scanning direction with respect to the substrate lifted to the predetermined height from the stationary stage,
• wherein the sub-scanning direction mover moves the droplet discharger in the sub-scanning direction while the main scanning direction mover continues to move the substrate in the main scanning direction and the droplet discharger continues to drop the droplet such that a drawing pattern of the functional liquid is formed on the substrate by moving a landing position of the droplet of the functional liquid on the substrate in the main scanning direction and the sub-scanning direction, and
• wherein each substrate holder mounted on each of the multiple scanning direction sliders includes a rotation supporter having an x-axis position correction slider configured to move along an x-axis position correction guide and a y-axis position correction slider configured to move along a y-axis position correction guide, the rotation supporter configured to rotate the substrate held by each substrate holder when viewed from above.