Vacuum evacuation system
AssigneeEbara Corporation
InventorsAtsushi Shiokawa, Tetsuro Sugiura, Shinichi Sekiguchi, Takashi Kyotani, Tetsuo Komai, Norio Kimura, Keiichi Ishikawa, Toru Osuga
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AssigneeEbara Corporation
InventorsAtsushi Shiokawa, Tetsuro Sugiura, Shinichi Sekiguchi, Takashi Kyotani, Tetsuo Komai, Norio Kimura, Keiichi Ishikawa, Toru Osuga
Estimating the term…
The present invention relates to a vacuum evacuation system used to evacuate a processing gas from one or more process chambers for use in, for example, a semiconductor-device manufacturing apparatus. The vacuum evacuation system is a vacuum apparatus for evacuating a gas from a plurality of process chambers (1). The vacuum evacuation system includes a plurality of first vacuum pumps (5) coupled to the plurality of process chambers (1) respectively, a collecting pipe (7) coupled to the plurality of first vacuum pumps (5), and a second vacuum pump (8) coupled to the collecting pipe (7).
A vacuum evacuation system for evacuating a gas from a plurality of process chambers, comprising:
Dependencies are inferred from the claim text.