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US 10,971,353 B2Granted
Method for dehydrating semiconductor structure and dehydrating method of the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorChung-Chieh Lee
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Abstract
The present disclosure provides a method for dehydrating a semiconductor structure, including providing a semiconductive substrate, forming a trench on the semiconductive substrate, dispensing an agent in liquid form into the trench, solidifying the agent, and dehydrating a surface in the trench by transforming the agent from solid form to vapor form.
Claims20
A method for dehydrating a semiconductor structure, comprising:
- providing a substrate;
- forming a trench on the substrate;
- dispensing diluted hydrogen fluoride into the trench;
- dispensing isopropanol into the trench subsequent to dispensing diluted hydrogen fluoride;
- dispensing an agent in liquid form into the trench subsequent to dispensing isopropanol;
- solidifying the agent;
- and
- transforming the agent from solid form to vapor form.
5 more elements
A method for fabricating a semiconductor structure, comprising:
- forming a transistor, comprising:
- providing a substrate;
- forming a plurality of fins over the substrate;
- dispensing diluted fluoride into the spaces between the plurality of fins;
- dispensing deionized water into the trench subsequent to dispensing diluted fluoride;
- dispensing isopropanol into the trench subsequent to dispensing deionized water;
- flowing an agent in spaces between the plurality of fins;
- solidifying the agent in the spaces;
- transforming the solidified agent into vapor in a chamber;
- and
- providing gaseous H2O steam in the chamber subsequent to transforming the solidified agent into vapor.
8 more elements
A method for dehydrating a substrate, comprising:
- providing a substrate;
- dispensing diluted fluoride over the substrate;
- dispensing deionized water over the substrate subsequent to dispensing diluted fluoride;
- dispensing isopropanol into the trench subsequent to dispensing deionized water;
- dispensing an agent in liquid form over the substrate;
- solidify the agent;
- vaporizing the agent from solid form to vapor form inside a chamber;
- and
- providing gaseous H2O steam in the chamber subsequent to vaporizing the agent.
6 more elements
Dependencies are inferred from the claim text.