Termination for vertical trench shielded devices
AssigneeVishay-Siliconix
InventorsJun Hu, M. Ayman Shibib, Misbah Azam, Kyle Terrill
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AssigneeVishay-Siliconix
InventorsJun Hu, M. Ayman Shibib, Misbah Azam, Kyle Terrill
Estimating the term…
A vertical trench shield device can include a plurality of gate structures and a termination structure surrounding the plurality of gate structures. The plurality of gate structures can include a plurality of gate regions and a corresponding plurality of gate shield regions. The plurality of gate structures can be disposed between the plurality of source regions, and extending through the plurality of body regions to the drift region. The plurality of gate structures can be separated from each other by a first predetermined spacing in a core area. A first set of the plurality of gate structures can extend fully to the termination structure. The ends of a second set of the plurality of gate structures can be separated from the termination structure by a second predetermined spacing. The first and second spacings can be configured to balance charge in the core area and the termination area in a reverse bias condition.
A Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET) device comprising:
A MOSFET device comprising:
A Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET) device comprising:
Dependencies are inferred from the claim text.