Gas supply mechanism and semiconductor manufacturing system
AssigneeTokyo Electron Limited
InventorsYuki Hosaka, Yoshihiro Umezawa, Toshiki Nakajima, Mayo Uda, Kenichi Shimono
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AssigneeTokyo Electron Limited
InventorsYuki Hosaka, Yoshihiro Umezawa, Toshiki Nakajima, Mayo Uda, Kenichi Shimono
Estimating the term…
The mechanism includes a pipe and a valve provided in the pipe. The pipe is configured to connect a gas source and a semiconductor manufacturing apparatus. The valve is configured to control a flow rate of the gas. The valve includes a housing and a columnar shaft. The housing includes an inlet and an outlet. A gas flows from the gas source into the internal space through the inlet. A gas flows from the internal space to the semiconductor manufacturing apparatus through the outlet. A gap is provided between an outer peripheral surface of the shaft and an inner wall surface of the housing. The shaft is accommodated in the internal space of the housing and is rotatable. A through hole which penetrates the shaft is formed on the outer peripheral surface of the shaft. Both ends of the through hole correspond to the inlet and the outlet.
A gas supply mechanism for supplying a gas from a gas source to a semiconductor manufacturing apparatus, comprising:
A semiconductor manufacturing system comprising a gas supply mechanism for supplying a gas from a gas source to a semiconductor manufacturing apparatus,
A valve for controlling a flow rate of a gas supplied to a semiconductor manufacturing apparatus, comprising:
A gas supply mechanism for supplying a gas from a gas source to a semiconductor manufacturing apparatus, comprising:
Dependencies are inferred from the claim text.