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US 10,950,449 B2Granted
Substrate processing apparatus
AssigneeASM IP Holding B.V.
InventorsWataru Adachi, Kazuo Sato
Life of this patent
Estimating the term…
Abstract
Examples of a substrate processing apparatus includes a chamber, a susceptor provided in the chamber, a flow control ring of an insulator that is mounted on the chamber and surrounds the susceptor, a shower plate opposed to the susceptor, and a metal film that is formed on a lower surface of the flow control ring while exposing an upper surface of the flow control ring, and is in contact with the chamber.
Claims9
A substrate processing apparatus comprising:
- a chamber;
- a susceptor provided in the chamber;
- a flow control ring of an insulator that is mounted on an inner side wall of the chamber and surrounds the susceptor, substantially all of an upper surface of the flow control ring is exposed;
- a shower plate opposed to the susceptor;
- and
- a metal film that is continuously formed on a lower surface of the flow control ring while exposing the upper surface of the flow control ring, and is in contact with the chamber, the metal film disposed between the lower surface of the flow control ring and the chamber, and further extending radially inward past the inner side wall of the chamber into a space formed between the inner side wall of the chamber and the susceptor.
3 more elements
Dependencies are inferred from the claim text.