Atmospheric pressure plasma device
AssigneeFuji Corporation
InventorsTakahiro Jindo, Toshiyuki Ikedo, Akihiro Niwa
Life of this patent
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Abstract
An atmospheric pressure plasma device including a plasma head; a gas tube configured to supply a gas to the plasma head; a flow rate controller configured to control a flow rate of the gas supplied to the gas tube; a pressure sensor arranged downstream of the flow rate controller and configured to detect a pressure in the gas tube; and a determining section configured to determine a state of the device based on how the pressure in the gas tube deviates from a standard value specified for each flow rate of the supplied gas. As a result, it is possible to determine the gas leakage of the atmospheric pressure plasma device. Further, it is possible to determine whether plasma is being generated in a favorable state.
Claims5
An atmospheric pressure plasma device comprising:
- a plasma head including a main body block;
- a reaction chamber, a first flow gas path, and a pair of second flow gas paths, each included in the main body block;
- a pair of electrodes respectively included in the second flow gas paths;
- a pair recesses included in the main body block, the pair of second flow gas paths respectively open into the pair of recesses, and the first flow gas path is formed between the pair of recesses;
- a gas tube configured to supply a gas to the plasma head, the gas tube including a first gas tube connected to the first flow gas path and a second gas tube connected to the pair of second flow gas paths;
- a flow rate controller configured to control a flow rate of the gas supplied to the gas tube;
- a pressure sensor arranged downstream of the flow rate controller and configured to detect a pressure in the gas tube;
- and
- a determining section configured to determine a state of the device based on how the pressure in the gas tube deviates from a standard value specified for each flow rate of the supplied gas.
Dependencies are inferred from the claim text.