Plasma processing apparatus and plasma processing method

A plasma processing apparatus for performing a plasma processing on a substrate within a processing container, comprising:

• an upper electrode disposed above the processing container;
• a cylindrical shield member provided on the processing container and configured to support a matching device;
• a power feeding rod disposed inward of the shield member and configured to supply a high-frequency power provided from a plasma source to the upper electrode via the matching device;
• a gas introduction member configured to supply a processing gas heated outside the shield member into the processing container from above the upper electrode;
• and
• a sealing member provided outside the shield member and on a peripheral edge of a penetration portion of the shield member through which the gas introduction met her penetrates, the sealing member being made of a conductive material having a lower thermal conductivity than materials of the gas introduction member and the shield member,
• wherein the gas introduction member and the shield member are grounded to an earth.