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AssigneeASML Netherlands B.V.
InventorsAn Gao, Sanjaysingh Lalbahadoersing, Andrey Alexandrovich Nikipelov, Alexey Olegovich Polyakov, Brennan Peterson
Estimating the term…
An apparatus for determining information relating to at least one target alignment mark in a semiconductor device substrate. The target alignment mark is initially at least partially obscured by an opaque carbon or metal layer on the substrate. The apparatus includes an energy delivery system configured to emit a laser beam for modifying at least one portion of the opaque layer to cause a phase change and/or chemical change in the at least one portion that increases the transparency of the portion. An optical signal can propagate through the modified portion to determine information relating to the target alignment mark.
An apparatus for determining information relating to at least one feature in or on a semiconductor device substrate, wherein the at least one feature is at least partially obscured by a layer comprising carbon, such that an optical signal for determining the information relating to the at least one feature is prevented from reaching the feature, the apparatus comprising:
A method for enabling determining information relating to at least one feature in or on a semiconductor device substrate, wherein the at least one feature is at least partially obscured by a layer comprising carbon, such that an optical signal for determining information relating to the at least one feature is prevented from reaching the feature, the method comprising:
A computer program product comprising a non-transitory computer-readable medium having instructions therein, the instructions, upon execution by a processor system, configured to cause the processor system to at least control an apparatus to at least:
Dependencies are inferred from the claim text.