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US 10,948,831 B2Granted
Methods of determining process models by machine learning
AssigneeASML Netherlands B.V.
InventorsYa Luo, Yu Cao, Jen-Shiang Wang, Yen-Wen Lu
Life of this patent
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Abstract
Methods of determining, and using, a patterning process model that is a machine learning model. The process model is trained partially based on simulation or based on a non-machine learning model. The training data may include inputs obtained from a design layout, patterning process measurements, and image measurements.
Claims22
A method comprising:
- obtaining values of inputs of a process model of a patterning process;
- obtaining values of a first set of one or more physical characteristics of an image formed on a substrate under a processing condition represented by the values of the inputs;
- obtaining simulated values of a second set of one or more characteristics of the image;
- and
- determining, by a hardware computer, the process model based on training data comprising samples whose feature vector comprises the values of the inputs and whose supervisory signal comprises the values of the first set, and based on the simulated values of the second set, the process model configured to output one or more physical characteristics of an image formed on a substrate using the patterning process or output one or more characteristics of the patterning process to achieve a particular result of the patterning process.
2 more elements
A computer program product comprising a non-transitory computer readable medium having instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to at least:
- obtain values of inputs of a process model of a patterning process;
- obtain values of a first set of one or more physical characteristics of an image formed on a substrate under a processing condition represented by the values of the inputs;
- obtain simulated values of a second set of one or more characteristics of the image;
- and
- determine the process model based on training data comprising samples whose feature vector comprises the values of the inputs and whose supervisory signal comprises the values of the first set, and based on the simulated values of the second set, the process model configured to output one or more physical characteristics of an image formed on a substrate using the patterning process or output one or more characteristics of the patterning process to achieve a particular result of the patterning process.
2 more elements
Dependencies are inferred from the claim text.