Pattern forming apparatus, alignment mark detection method, and pattern forming method
AssigneeCanon Kabushiki Kaisha
InventorNaoki Funabashi
Life of this patent
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Abstract
A pattern forming apparatus configured to form a pattern on a substrate includes a holding portion configured to hold the substrate by suction, an optical system configured to detect, from a suction surface side of the substrate, an alignment mark provided to the substrate held by the holding portion, and a unit configured to shield light entering the optical system.
Claims25
A pattern forming apparatus configured to form a pattern on a substrate, the pattern forming apparatus comprising:
- a first optical system configured to emit first light on the substrate for forming the pattern on the substrate;
- a holding portion configured to hold the substrate by suction;
- a detection unit configured to emit second light for detecting, via a second optical system from a suction surface side of the substrate, an alignment mark provided to the substrate held by the holding portion;
- and
- a unit configured to shield the first light incident to the second optical system while the first optical system emits the first light and transmits the second light incident to the second optical system while the detection unit emits the second light
- wherein the first optical system and the detection unit are disposed apart from each other in a direction perpendicular to the optical axis of the first optical system, and the unit shields the first light emitted from the first optical system and transmit the second light emitted from the detection unit.
A method of detecting an alignment mark in a pattern forming apparatus that includes a first optical system configured to emit first light on the substrate for forming the pattern on the substrate, a holding portion configured to hold a substrate by suction, a detection unit configured to emit second light for detecting, via a second optical system from a suction surface side of the substrate, an alignment mark provided to the substrate held by the holding portion, and a unit configured to shield and transmit light incident to the second optical system, the method comprising:
- controlling a light transmission state of the unit in such a manner that the first light incident to the second optical system is shielded while the first optical system emits the first light and the second light incident to the second optical system is transmitted while the detection unit emits the second light;
- and
- detecting, via the second optical system, an image of the alignment mark which is formed on an image plane.
A method of forming a pattern in a pattern forming apparatus that includes a first optical system configured to emit first light one the substrate for forming the pattern on the substrate, a holding portion configured to hold a substrate by suction, a detection unit configured to emit second light for detecting, via a second optical system from a suction surface side of the substrate, an alignment mark provided to the substrate held by the holding portion, and a unit configured to shield and transmit light incident to the second optical system, the method comprising:
- controlling a light transmission state of the unit in such a manner that the first light incident to the second optical system is shielded while the first optical system emits the first light and the second light incident to the second optical system is transmitted while the detection unit emits the second light;
- and
- forming a pattern on the substrate by applying the first light toward the substrate.
A method of manufacturing an article, the method comprising:
- forming a pattern on a substrate using a pattern forming apparatus configured to form the pattern on the substrate;
- and
- manufacturing an article by processing the substrate on which the pattern is formed,
- wherein the pattern forming apparatus includes:
- a first optical system configured to emit first light on the substrate for forming the pattern on the substrate;
- a holding portion configured to hold the substrate by suction;
- a detection unit configured to emit second light for detecting, via a second optical system from a suction surface side of the substrate, an alignment mark provided to the substrate held by the holding portion;
- and
- a unit configured to shield the first light incident to the second optical system while the first optical system emits the first light and transmit the second light incident to the second optical system while detection unit emits the second light.
Dependencies are inferred from the claim text.