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US 10,948,818 B2Granted
Methods and apparatus for creating a large area imprint without a seam
AssigneeApplied Materials, Inc.
InventorsKevin Laughton Cunningham, Manivannan Thothadri
Life of this patent
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Abstract
Embodiments of the present disclosure generally relate to imprint lithography, and more particularly to methods and apparatus for creating a large area imprint without a seam. Methods disclosed herein generally include separating the curing time of the features in a stamp or product from the curing time of the seam and the periphery. The seam and periphery can be cured first or the seam and periphery can be cured last. Additionally, the seam curing operations can be performed on the master, on the stamp, or on the final product.
Claims6
An imprint lithography method, comprising:
- imprinting a stamp material with a plurality of masters adhered to a backing plate to form a stamp, each master having a plurality of features thereon, and each pair of the plurality of masters having a seam therebetween;
- positioning a mask between an ultraviolet light source and the stamp material;
- and
- exposing the stamp material to ultraviolet light from the ultraviolet light source directed through the mask to form cured portions and uncured portions of the stamp material, wherein the cured portions of the stamp material comprise a periphery of the stamp material and the exposing the stamp material to ultraviolet light occurs before the imprinting of the stamp material with the plurality of masters.
1 more element
Dependencies are inferred from the claim text.