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US 10,948,790 B2Granted
Display panel manufacturing method and display panel
AssigneeShenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
InventorWu Cao
Life of this patent
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Abstract
A display panel manufacturing method and display panel are provided. By forming a first spacer on a first photoresist reservation region of a light-shielding layer and forming a second spacer on a second photoresist reservation region, photoresist material required to be removed is preserved to increase material usage rate such that display panel manufacturing processes are reduced and productivity is raised.
Claims16
A display panel manufacturing method, comprising steps as follows:
- providing a substrate, wherein the substrate comprises a display region and a non-display region;
- forming a photoresist layer on the substrate, and exposing and developing the photoresist layer to form a photoresist pattern on the photoresist layer, wherein the photoresist pattern comprises a first photoresist reservation region and a second photoresist reservation region;
- and
- coating a light-shielding material on a portion of the substrate with the photoresist pattern, and exposing and developing the light-shielding material to form a light-shielding layer on the non-display region of the substrate, wherein the light-shielding layer forms a first spacer on the first photoresist reservation region and forms a second spacer on the second photoresist reservation region, and a height of the first spacer is greater than a height of the second spacer;
- wherein the step of forming a photoresist layer on the substrate employs a first mask plate to expose and develop the photoresist layer to form the photoresist pattern, and the photoresist pattern comprises the first photoresist reservation region and the second photoresist reservation region;
- and
- wherein the photoresist layer is made of positive photoresist or negative photoresist.
4 more elements
A display panel manufacturing method, comprising:
- providing a substrate, wherein the substrate comprises a display region and a non-display region;
- forming a photoresist layer on the substrate, and, exposing and developing the photoresist layer to form a photoresist pattern on the photoresist layer, wherein the photoresist pattern comprises a first photoresist reservation region and a second photoresist reservation region;
- and
- coating a light-shielding material on a portion of the substrate with the photoresist pattern, and exposing and developing the light-shielding material to form a light-shielding layer on the non-display region of the substrate, wherein the light-shielding layer forms a first spacer on the first photoresist reservation region and forms a second spacer on the second photoresist reservation region, and a height of the first spacer is greater than a height of the second spacer.
1 more element
Dependencies are inferred from the claim text.