Color filter substrate, fabricating method thereof, and display device

A display device, comprising a color filter substrate, the color filter substrate comprising:

• a base substrate;
• and
• a filter layer on the base substrate and comprising a plurality of color resist units of a plurality of colors,
• wherein orthographic projections of adjacent color resist units of different colors on the base substrate have an overlapping region;
• and
• wherein the plurality of color resist units of the plurality of colors comprise a first color resist unit having a first color and a plurality of second color resist units having a plurality of colors, light transmittance of the first color resist unit is lower than light transmittances of the second color resist units, and an alignment mark is provided between two adjacent second color resist units having different colors.

A method for fabricating a color filter substrate, wherein the color filter substrate comprises:

• a base substrate;
• and a filter layer on the base substrate and comprising a plurality of color resist units of a plurality of colors, wherein orthographic projections of adjacent color resist units of different colors on the base substrate have an overlapping region, and the method comprises:
• sequentially forming the plurality of color resist units of the plurality of colors on the base substrate,
• wherein a boundary of the color resist unit previously formed determines a starting boundary of the color resist unit that is to be formed subsequently and adjacent to the color resist unit previously formed;
• wherein the plurality of color resist units comprise a first color resist unit having a first color and a plurality of second color resist units having a plurality of colors, light transmittance of the first color resist unit is lower than light transmittances of the second color resist units, and sequentially forming the plurality of color resist units of the plurality of colors on the base substrate comprises:
• forming, on the base substrate, the first color resist unit by a first patterning process;
• and
• sequentially forming the second color resist units having the plurality of colors by patterning processes based on an edge of the first color resist unit wherein color resist units having a same color among the second color resist units are simultaneously formed through a same patterning process;
• and
• the method further comprises:
• forming an alignment mark, wherein the alignment mark is disposed between adjacent second color resist units of different colors that are subsequently formed, and in a step of sequentially forming the second color resist units, an edge, away from the first color resist unit, of the second color resist unit having a first color which is first formed is determined by the alignment mark.