Thin film coatings on transparent substrates and methods of making and using thereof

A method of preparing a transparent article, the method comprising:

• (a) providing a substrate adapted to carry a transparent and electrically conductive thin film thereon, the thin film including an optical matching stress releasing layer, a first antireflection layer, a metal layer adapted for infra-red reflection and electrical conductivity, a second antireflection layer, and an optional transparent outermost protective transparent layer, the substrate layer having a thickness ranging from 1000 Å to 10,000 Å;
• (b) depositing the optical matching stress releasing layer directly on the substrate at a thickness ranging from 1000 Å to 10,000 Å;
• (c) depositing the first antireflection layer directly on the optical matching stress releasing layer at a thickness ranging from 100 Å to 1,000 Å;
• (d) depositing the metal layer adapted for infra-red reflection and electrical conductivity directly deposited on the first antireflection layer at a thickness ranging from 50 Å to 400 Å;
• and
• (e) depositing the second antireflection layer directly on the metal layer adapted for infra-red reflection at a thickness ranging from 100 Å to 1000 Å thereby forming the transparent article,
• wherein:
• no layer is positioned between the metal layer adapted for infra-red reflection and electrical conductivity and the second antireflection layer,
• the transparent and electrically conductive thin film maintains, without loss, optical and electrical properties for up to nine years when stored at ambient humidity and/or room temperature, and
• the second antireflection layer comprises W or oxides thereof, and
• the article has an optical transparency of at least 30% between a wavelength ranging from 380 nm to 780 nm and has at least 30% solar reflectance at a wavelength ranging from 380 nm to 2200 nm, and
• the article has an electrical sheet resistance of ranging from 1 to 100 Ohm/sq.