Processing arrangement and method for conditioning a processing arrangement

A processing arrangement, comprising:

• a process chamber for processing a substrate within a processing region, wherein the process chamber comprises an upper chamber wall, a lower chamber wall and two lateral chamber walls;
• an insulating structure, which is arranged between the processing region and each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, for thermally insulating the processing region, wherein the insulating structure is configured as gas-permeable at least in sections in such a way that a process gas from the processing region can flow out of the processing region in a direction of each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, through the insulating structure;
• and
• a gas channel, which is arranged between the insulating structure and each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, for pumping away the process gas which flows through the insulating structure;
• a coating device for coating the substrate within the processing region, wherein the coating device is configured to introduce a pulverulent material into the processing region by means of the process gas and to evaporate the pulverulent material within the processing region for the purpose of coating the substrate by means of the evaporated material.