Integrated circuits and semiconductor device including standard cell

An integrated circuit comprising a standard cell, wherein the standard cell includes:

• a first active region and a second active region having different conductivity types and each extending in a first direction;
• a field region between the first active region and the second active region;
• a substrate;
• a first conductive line extending in a second direction that crosses the first direction, the first conductive line being on the substrate in the first active region, the second active region, and the field region;
• an isolation insulating layer in the field region, the isolation insulating layer separating the first conductive line into a first upper conductive line and a first lower conductive line and electrically insulating the first upper conductive line and the first lower conductive line from each other;
• a first lower contact in the field region and on the first lower conductive line;
• a first upper contact in the field region and on the first lower contact, the first upper contact extending in the second direction and overlapping the isolation insulating layer;
• and
• a contact jumper in the first active region, the contact jumper crossing the first upper conductive line,
• wherein the contact jumper is at a same level as or at a lower level than the first upper contact relative to a main surface of the substrate.

An integrated circuit comprising a standard cell, wherein the standard cell includes:

• a first active region and a second active region having different conductivity types and each extending in a first direction;
• a field region between the first active region and the second active region;
• an upper conductive line in the first active region, the upper conductive line extending in a second direction that crosses the first direction;
• a lower conductive line in the second active region and the field region, the lower conductive line extending in the second direction, being spaced apart from the upper conductive line in the second direction, and being on a same line as the upper conductive line;
• an interconnection line in the field region, the interconnection line extending in the first direction and being between the upper conductive line and the lower conductive line in a plan view;
• and
• an upper contact in the field region, the upper contact extending in the second direction and overlapping the interconnection line and the lower conductive line,
• wherein:
• the lower conductive line is electrically connected to the interconnection line, and
• the upper conductive line is electrically insulated from the lower conductive line.