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US 10,941,342 B2Granted
Etchant composition and method of manufacturing wiring substrate using the same
AssigneeSamsung Display Co., Ltd.
InventorsBong Kyun Kim, Jin Suek Kim, Seung Bo Shim, Shin Hyuk Choi, Seung Hee Kim, Dong Hee Lee, In Seol Kuk, Beom Soo Kim, Sang Tae Kim, Young Chul Park, Young Jin Yoon, Dae Sung Lim
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Abstract
An etchant composition may include: a peroxosulfate; a cyclic amine compound; a first amphoteric compound including a carboxyl group; and a second amphoteric compound including a sulfone group, wherein the second amphoteric compound may be different from the first amphoteric compound.
Claims19
An etchant composition, comprising:
- a peroxosulfate;
- a cyclic amine compound;
- a first compound comprising a carboxyl group and at least one of compounds represented by Formulae Ia, Ib, Ic, Id, and Ie below:
- and
- a second compound comprising a sulfone group,
- wherein the second compound is different from the first compound.
3 more elements
A method of manufacturing a wiring substrate, comprising:
- forming a first wiring layer on a substrate, comprising:
- forming a first metal layer on the substrate;
- forming a second metal layer on the first metal layer, the second metal layer being different from the first metal layer;
- and
- patterning the first metal layer and the second metal layer using an etchant composition, comprising:
- a peroxosulfate;
- a cyclic amine compound;
- a first compound comprising a carboxyl group and at least one of compounds represented by Formulae Ia, Ib, Ic, Id, and Ie below:
- and
- a second compound comprising a sulfone group,
- wherein the second compound is different from the first compound.
8 more elements
Dependencies are inferred from the claim text.