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US 10,935,505 B2Granted
Scanning electron microscope and method for determining crystal orientations
AssigneeJEOL Ltd.
InventorsTakeshi Otsuka, Kenichi Yamashita
Life of this patent
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Abstract
A charged particle beam device includes: a plurality of detecting units which detect charged particles diffracted by a specimen; and an intensity pattern information generating unit which generates, based on intensities of a plurality of detection signals output from the plurality of detecting units, intensity pattern information that represents the intensities of the plurality of detection signals as a pattern.
Claims13
A scanning electron microscope (SEM) comprising:
- a plurality of detecting units which detect backscattered electrons scattered by a specimen;
- an intensity pattern information generating unit which generates, based on intensities of a plurality of detection signals output from the plurality of detecting units, intensity pattern information that represents the intensities of the plurality of detection signals as a pattern;
- a scanning deflector for scanning the specimen with an electron beam;
- a pattern analyzing unit which analyzes the intensity pattern information associated with an incidence position of the electron beam with respect to the specimen;
- and
- an image generating unit which generates a pattern analysis image which indicates a distribution of crystal orientations of the specimen based on an analysis result by the pattern analyzing unit,
- wherein the plurality of detecting units are constituted by a segmented detector having a plurality of first to n-th detection regions which are arranged to be rotationally symmetric around an optical axis,
- the segmented detector has a through-hole for allowing the electron beam to pass and travel along the optical axis,
- first to n-th detection signals are output from the first to n-th detection regions, respectively, and
- the pattern of the intensity pattern information is formed by plotting intensities of the first to n-th detection signals on intensity axes of the first to n-th detection signals, respectively.
7 more elements
A scanning electron microscope (SEM) comprising:
- a plurality of detecting units which detect backscattered electrons scattered by a specimen;
- a scanning deflector for scanning the specimen with an electron beam;
- an intensity pattern information generating unit which generates a line profile based on intensities of a plurality of detection signals output from the plurality of detecting units;
- and
- a line profile analyzing unit which specifies a crystal orientation based on the line profile,
- wherein the plurality of detecting units are constituted by a segmented detector having a plurality of first to n-th detection regions which are arranged to be rotationally symmetric around an optical axis,
- the segmented detector has a through-hole for allowing the electron beam to pass and travel along the optical axis.
4 more elements
An analysis method comprising:
- using a scanning electron microscope (SEM) to detect backscattered electrons scattered by a specimen with a plurality of detecting units;
- generating, based on intensities of a plurality of detection signals output from the plurality of detecting units, intensity pattern information that represents the intensities of the plurality of detection signals as a pattern;
- analyzing the intensity pattern information associated with an incidence position of the electron beam with respect to the specimen;
- and
- generating a pattern analysis image which indicates a distribution of crystal orientations of the specimen based on an analysis result by a pattern analyzing unit,
- wherein the plurality of detecting units are constituted by a segmented detector having a plurality of first to n-th detection regions which are arranged to be rotationally symmetric around an optical axis,
- the segmented detector has a through-hole for allowing the electron beam to pass and travel along the optical axis,
- first to n-th detection signals are output from the first to n-th detection regions, respectively, and
- the pattern of the intensity pattern information is formed by plotting intensities of the first to n-th detection signals on intensity axes of the first to n-th detection signals, respectively.
6 more elements
An analysis method, comprising:
- using a scanning electron microscope (SEM) to detect backscattered electrons scattered by a specimen with a plurality of detecting units;
- generating a line profile based on intensities of detection signals output from the plurality of detecting units;
- and
- specifying a crystal orientation based on the line profile,
- wherein the plurality of detecting units are constituted by a segmented detector having a plurality of first to n-th detection regions which are arranged to be rotationally symmetric around an optical axis,
- the segmented detector has a through-hole for allowing the electron beam to pass and travel along the optical axis.
3 more elements
Dependencies are inferred from the claim text.