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US 10,926,211 B2Granted
Method for purifying fluorine compound gas
AssigneeCentral Glass Company, Limited
InventorsAkifumi Yao, Kohei Ooya, Yuta Takeda, Jun Eto
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AssigneeCentral Glass Company, Limited
InventorsAkifumi Yao, Kohei Ooya, Yuta Takeda, Jun Eto
Estimating the term…
Disclosed is a purification method for removing a metal component from a fluorine compound gas containing hydrogen fluoride and a metal component. This method includes a removing step for removing the hydrogen fluoride and the metal component therefrom by bringing the fluorine compound gas into contact with a solid metal fluoride to adsorb the hydrogen fluoride and the metal component on the metal fluoride. It is preferable for the fluorine compound gas to contain at least one kind selected from the group consisting of CIF, CIF3, IF5, IF7, BrF3, BrF5, NF3, WF6, SiF4, CF4, SF6 and BF3. It is also preferable for the metal fluoride to be an alkali metal fluoride or an alkali earth metal fluoride. Surprisingly, the presence of hydrogen fluoride in a fluorine compound gas makes it possible to remove a metal component therefrom as an impurity as a result of adsorption thereof by a metal fluoride.
A method for purifying a fluorine compound gas by removing a metal component from a fluorine compound gas that contains hydrogen fluoride and the metal component, the method comprising the step of:
A method for purifying a fluorine compound gas by removing a metal component from a fluorine compound gas, wherein the fluorine compound gas is at least one kind selected from the group consisting of CIF, CIF3, IF5, IF7, BrF3, BrF5, NF3, WF6, SiF4, CF4, SF6 and BF3, and contains hydrogen fluoride and at least one metal component selected from the group consisting of Fe, Cr, Mn, Co, Ti, Mo, Cu and Ni, the method comprising the step of:
A method for manufacturing a purified fluorine compound gas by removing a metal component contained in a fluorine compound gas, comprising the step of:
Dependencies are inferred from the claim text.