Chemical compositions and treatment systems and treatment methods using same for remediating H2S and other contaminants in gasses
AssigneeGaps Technology, LLC.
InventorCliffton Lee Roe
Life of this patent
Estimating the term…
Abstract
A treatment composition for remediating for remediating H2S and other contaminant(s) in contaminated gasses comprising: an aqueous hydroxide solution containing at least one hydroxide compound at a collective concentration of 35-55 weight percent of the aqueous hydroxide solution; at least one organic acid selected from the group consisting of fulvic acid and humic acid; and a chelating agent, wherein the aqueous hydroxide solution constitutes at least 80 wt % of the treatment composition, the at least one organic acid constitutes 0.1-5 wt % of the treatment composition, the chelating agent constitutes 0.1-5 wt % of the treatment composition, and a pH of the treatment composition is at least 12.0.
Claims19
A treatment composition for remediating H2S and other contaminant(s) in contaminated gases comprising:
- an aqueous hydroxide solution containing at least one hydroxide compound at a collective concentration of 35-55 weight percent of the aqueous hydroxide solution;
- at least one organic acid selected from the group consisting of fulvic acid and humic acid;
- and a chelating agent, wherein the aqueous hydroxide solution constitutes at least 80 wt % of the treatment composition, the at least one organic acid constitutes 0.1-5 wt % of the treatment composition, the chelating agent constitutes 0.1-5 wt % of the treatment composition, and a pH of the treatment composition is at least 12.0.
Dependencies are inferred from the claim text.