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US 10,897,808 B2Granted
Filter device and plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsNozomu Nagashima, Naohiko Okunishi
Life of this patent
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Abstract
A filter device includes a plurality of coils of which central axes are spaced apart from one another and in parallel to one another and a plurality of ground members spaced apart from one another and extending in parallel to the central axes of the coils outside of the coils. Each of the coils is spaced apart from another coil closest thereto by a first distance. Each of the ground members is spaced apart from a coil closest thereto by a second distance. The number of ground members spaced apart from each of the coils by the second distance is the same.
Claims9
A filter device comprising:
- a plurality of coils each having a central axis, wherein the central axes are spatially offset from one another and in parallel to one another;
- and a plurality of ground members each connected to at least one ground region of the filter device, wherein the plurality of ground members are spaced apart from one another and extend in parallel to the central axes of the coils at positions outside of the coils,
- wherein each of the coils is spaced apart from another coil closest thereto by a first distance,
- each of the ground members is spaced apart from a coil closest thereto by a second distance, and
- the number of ground members spaced apart from each of the plurality of coils by the second distance is the same.
2 more elements
Dependencies are inferred from the claim text.