Display device and manufacturing method of display device

A display device comprising:

• a base material;
• a thin-film transistor (TFT) layer on the base material;
• an organic insulating film on the TFT layer;
• a light-emitting layer on the organic insulating film;
• a sealing layer on the light-emitting layer;
• an active region that displays an image;
• a notch surrounded by an end portion of the active region;
• and
• a first protruding portion on a peripheral end side of the active region where the notch is located, wherein
• the light-emitting layer is disconnected as a result of a step at the first protruding portion,
• the TFT layer includes an organic interlayer film and an inorganic insulating film,
• a first slit in the organic interlayer film and the organic insulating film is between the active region and the notch,
• the first protruding portion is in an interior of the first slit on the inorganic insulating film, and
• the first protruding portion is located on the inorganic insulating film, and the inorganic insulating film includes a second slit between the first protruding portion and the notch, the second slit not overlapping with the first protruding portion and being positioned closer to the notch than to the first protruding portion, the second slit overlapping the organic interlayer film and the organic insulating film.