Substrate processing method and substrate processing apparatus
AssigneeTokyo Electron Limited
InventorsKazuhito Yamada, Hiroki Endo
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Abstract
In substrate processing method, a change in a voltage, which is applied to a component provided in a substrate processing apparatus configured to process a substrate, is measured and a current flowing through the component is measured. A temperature of the component is obtained from a change in a resistance calculated based on the voltage and the current with reference to a conversion table in which a plurality of resistances is correlated with a plurality of temperatures. A determination of whether or not abnormality has occurred in a temperature of the substrate is made based on the change in the voltage, and processing of the substrate is stopped when it is determined that the abnormality has occurred.
Claims20
A substrate processing method comprising:
- measuring a change in a voltage applied to a component provided in a substrate processing apparatus configured to process a substrate and a current flowing through the component;
- obtaining a temperature of the component from a change in a resistance calculated based on the voltage and the current with reference to a conversion table in which a plurality of resistances is correlated with a plurality of temperatures;
- determining whether or not abnormality has occurred in a temperature of the substrate based on the change in the voltage;
- and
- stopping processing of the substrate when it is determined that the abnormality has occurred in said determining.
A substrate processing apparatus comprising:
- a processing unit configured to process a substrate;
- a voltmeter configured to measure a change in a voltage applied to a component provided in the processing unit;
- an ammeter configured to measure a current flowing through the component;
- and
- a controller configured to obtain a temperature of the component from a resistance calculated based on the voltage and the current with reference to a conversion table in which a plurality of resistances is correlated with a plurality of temperatures,
- wherein the controller determines whether or not an abnormality has occurred in a temperature of the substrate based on the change in the voltage and controls the processing unit to stop processing of the substrate when it is determined that the abnormality has occurred.
Dependencies are inferred from the claim text.