RF generating apparatus and plasma treatment apparatus

A RF generating apparatus configured to supply RF power, comprising:

• a plurality of RF generators which generate RF power different in frequency;
• a plurality of antennas installed inside a plasma reactor;
• and a plurality of matching boxes connected to the antennas to match outputs of the RF generators with one another,
• each of the RF generators including:
• an oscillator circuit which oscillates a RF wave having a set oscillation frequency;
• an arithmetic circuit which calculates a reflected power level and a reflection coefficient from a forward power and a reflected power detected;
• and a matching arithmetic unit which performs an operation for calculating, based on the reflection coefficient, a control value for the matching box and a candidate value for the oscillation frequency to make the reflected power level small, wherein
• based on the candidate value for the oscillation frequency, the matching arithmetic unit determines the oscillation frequency to be such a value as to secure a specific frequency difference from an oscillation frequency in any other RF generator and sets the oscillation frequency in the oscillator circuit, and
• the arithmetic circuit includes such a low-pass filter as to let a band lower than a cut-off frequency through and sets the cut-off frequency as a frequency obtained by adding the specific frequency difference to the set oscillation frequency.

A RF generating apparatus configured to supply RF power, comprising:

• a plurality of RF generators which generate RF power different in frequency;
• a plurality of antennas installed inside a plasma reactor;
• and a plurality of matching boxes connected to the antennas to match outputs of the RF generators with one another,
• each of the RF generators including:
• an oscillator circuit which oscillates a RF wave having a set oscillation frequency;
• an arithmetic circuit which calculates a reflected power level and a reflection coefficient from a forward power and a reflected power detected;
• and a matching arithmetic unit which performs an operation for calculating, based on the reflection coefficient, a control value for the matching box and a candidate value for the oscillation frequency to make the reflected power level small, and
• the RF generating apparatus further comprising an upper apparatus connected to the plurality of RF generators, wherein
• based on the candidate value for the oscillation frequency, the upper apparatus determines the oscillation frequency to be such a value as to secure a specific frequency difference from an oscillation frequency in any other RF generator and sets the oscillation frequency in the oscillator circuit.