Substrate holder, a lithographic apparatus and method of manufacturing devices

A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising:

• a main body having a main body surface;
• a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface;
• and
• a liquid control structure provided in a peripheral region of the main body surface and configured to hinder movement of liquid across the peripheral region toward the centre of the main body surface, but not to hinder movement of gas across the peripheral region, wherein the liquid control structure comprises a plurality of grooves extending essentially parallel to at least part of the periphery of the substrate holder.

A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising:

• a main body having a main body surface;
• a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface;
• and
• a plurality of first regions made of a material having a chemical or mechanical characteristic at the liquid-contacting surface of the first regions to have a first contact angle to a liquid and a plurality of second regions made of a material having a different chemical or mechanical characteristic at the liquid-contacting surface of the second regions to have a second contact angle to the liquid that is different from the first contact angle, the first and second regions alternating.