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AssigneesMitsui Chemicals, Inc., Tazmo Co., Ltd.
InventorsKazuo Kohmura, Daiki Taneichi, Yosuke Ono, Hisako Ishikawa, Tsuneaki Biyajima, Yasuyuki Sato, Toshiaki Hirota
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A method for producing a pellicle according to the one embodiment of the present invention produces a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film. The method includes forming the pellicle film on a substrate, and bonding a pressure-sensitive adhesive sheet, that is elastic and has a pressure-sensitive adhesive force thereof decreased upon receipt of external stimulation, to each of two surfaces of the substrate; making a notch inside a part of the substrate, the part having the pressure-sensitive adhesive sheets bonded thereto; separating a substrate outer peripheral portion outer to the notch of the substrate, in a state where the pressure-sensitive adhesive sheets are bonded to the substrate, to form a pellicle frame; and stimulating the pressure-sensitive adhesive sheets to peel off the pressure-sensitive adhesive sheets.
A method for producing a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film, the method comprising:
A method for producing a pellicle-attached photomask, comprising:
Dependencies are inferred from the claim text.