Antireflection film
AssigneeLG Chem, Ltd.
InventorsJin Seok Byun, Ja Pil Koo, Boo Kyung Kim, Seok Hoon Jang, Yeong Rae Chang
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Abstract
The present invention relates to an antireflection film which exhibits one extremum at a thickness of 35 nm to 55 nm from the surface and exhibiting one extremum at a thickness of 85 nm to 105 nm from the surface in a graph showing the result of Fourier transform analysis for the result of X-ray reflectivity measurement using Cu—K-alpha rays.
Claims17
An antireflection film comprising a hard coating layer, and a low refractive index layer disposed on the hard coating layer, the low refractive index layer containing a binder resin, and hollow inorganic nanoparticles and solid inorganic nanoparticles dispersed in the binder resin,
- the low refractive index layer exhibiting one extremum at a thickness of 35 nm to 55 nm and another extremum at a thickness of 85 nm to 105 nm, in a graph showing a result of Fourier transform analysis for X-ray reflectivity measurement using Cu—K-alpha rays,
- wherein each of the thickness of 35 nm to 55 nm and the thickness of 85 nm to 105 nm is a thickness from a surface of the low refractive index layer,
- wherein 70% by volume or more of the entire solid inorganic nanoparticles are present within 50% of the total thickness of the low refractive index layer from the interface between the hard coating layer and the low refractive index layer.
Dependencies are inferred from the claim text.