Modular thin film deposition system

A modular thin film deposition system, comprising:

• a machine base;
• a deposition head rigidly positioned relative to the machine base for depositing a thin film of material onto a process surface of a substrate, the deposition head having an output face that faces the process surface of the substrate;
• a motion actuator including a fixed portion rigidly attached to the machine base, and a moveable portion including kinematic mounting features;
• and
• one or more interchangeable substrate positioner modules adapted to mount on the moveable portion of the motion actuator, wherein the one or more interchangeable substrate positioner modules include mating kinematic mounting features that engage with the kinematic mounting features of the moveable portion of the motion actuator, each interchangeable substrate positioner module adapted to position the substrate in proximity to the output face of the deposition head such that the process surface of the substrate is parallel to the output face of the deposition head and the substrate is free to move in a direction normal to the output face of the deposition head;
• wherein the motion actuator moves the one or more interchangeable substrate positioner modules in a motion direction, thereby moving the substrate in an in-track direction in a plane parallel to the output face of the deposition head during deposition of the thin film of material onto the process surface of the substrate;
• the modular thin film deposition system further including:
• a gas-bearing backer having an output face for applying a non-contact force onto a back surface of the substrate opposite to the process surface of the substrate;
• and
• a backer positioning device rigidly attached to the machine base, wherein the backer positioning device positions the gas-bearing backer in alignment with the deposition head and constrains a lateral motion of the gas-bearing backer while enabling the gas-bearing backer to freely move in the direction normal to the output face of the deposition head;
• wherein the gas-bearing backer is moveable in a direction normal to the back surface of the substrate;
• and
• wherein the backer positioning device includes a frame having an aperture that a perimeter of the gas-bearing backer fits within.