Method for producing polishing composition and polishing method
AssigneeFujimi Incorporated
InventorsYoshihiro Izawa, Shota Suzuki
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Abstract
The present invention provides a method for producing a polishing composition which can polish an object to be polished at a high polishing speed and with fewer scratches (defects). The present invention is a method for producing a polishing composition, the method including: preparing silica in which an intensity of a peak of a silica four-membered ring structure and an intensity of a peak derived from a silica random network structure when analyzed by Raman spectroscopy satisfy a predetermined requirement; and mixing the silica with a dispersing medium.
Claims8
A method for producing a polishing composition, the method comprising:
- selecting silica on the basis that it satisfies the following intensity ratio of Condition 1 when analyzed by Raman spectroscopy;
- and
- mixing the silica with a dispersing medium and a pH adjusting agent to adjust a pH at 25° C. to 4.0 or more and less than 6.0,
- I(490 cm−1)/I(800 cm−1)≤2.30 Condition 1
- wherein I (490 cm′) represents an intensity of a peak derived from a silica four-membered ring structure, and I (800 cm−1) represents an intensity of a peak derived from a silica random network structure.
Dependencies are inferred from the claim text.