Nanosecond pulser pulse generation
AssigneeEagle Harbor Technologies, Inc.
InventorsTimothy Ziemba, Ilia Slobodov, John Carscadden, Kenneth Miller, Morgan Quinley
Life of this patent
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Abstract
Some embodiments include a high voltage pulsing power supply. A high voltage pulsing power supply may include: a high voltage pulser having an output that provides pulses with an amplitude greater than about 1 kV, a pulse width greater than about 1 μs, and a pulse repetition frequency greater than about 20 kHz; a plasma chamber; and an electrode disposed within the plasma chamber that is electrically coupled with the output of the high voltage pulser to produce a pulsing an electric field within the chamber.
Claims22
A high voltage pulsing power supply comprising:
- a high voltage pulser having an output that provides pulses with an amplitude greater than about 1 kV, a pulse width less than about 1 μs, and a pulse repetition frequency greater than about 20 kHz;
- a plasma chamber;
- an electrode disposed within the plasma chamber that is electrically coupled with the output of the high voltage pulser to produce an electric field within the plasma chamber;
- an enclosure having a volumetric dimension of less than 1 m3, wherein the high voltage pulser is disposed within the enclosure;
- and
- at least three of the following a thermal management system, a control system, a bias capacitor, a bias compensation power supply, a second high voltage pulser, a resistive output stage, and an energy recovery circuit being disposed within the enclosure.
A high voltage pulsing power supply comprising:
- a high voltage pulser having an output that provides pulses with an amplitude greater than about 1 kV, a pulse width less than about 1 μs, and a pulse repetition frequency greater than about 20 kHz;
- a plasma chamber;
- an electrode disposed within the plasma chamber that is electrically coupled with the output of the high voltage pulser to produce an electric field within the plasma chamber;
- a control module electrically coupled with the high voltage pulser, wherein the control module measures the voltage of the pulses at the electrode and the control module modifies at least one of the voltage, pulse width, and pulse repetition frequency of the pulses in response to the measured voltage;
- and
- a thermal management subsystem comprising a plurality of cold plates coupled with the high voltage pulser.
A high voltage pulsing power supply comprising:
- a first high voltage pulser having a first output that provides pulses with a first amplitude greater than about 1 kV, a first pulse width less than about 1 μs, and a first pulse repetition frequency greater than about 20 kHz;
- a second high voltage pulser having a second output that provides pulses with a second amplitude greater than about 1 kV, a second pulse width less than about 1 μs, and a second pulse repetition frequency greater than about 20 kHz;
- a plasma chamber;
- a first electrode disposed within the plasma chamber that is electrically coupled with the first output of the first high voltage pulser;
- a second electrode disposed within the plasma chamber that is electrically coupled with the second output of the second high voltage pulser;
- a first bias capacitor disposed between the first high voltage pulser and the first electrode;
- and
- a second bias capacitor disposed between the second high voltage pulser and the second electrode.
Dependencies are inferred from the claim text.