Back to results
US 10,889,926 B2Granted
Patch library system for stitching along a predetermined path
AssigneeOne Sciences, Inc.
InventorRobert S. Blenis, Jr.
Life of this patent
Estimating the term…
Abstract
Disclosed are various systems and features for use with a machine, such as a sewing machine, to facilitate patch library systems that may enable the storage and retrieval of patch configuration information. Such systems and features may be useful in the context of performing an action along a self-guided path on a substrate.
Claims19
A system for performing operations of a guiding apparatus, the system comprising:
- a patch library configured to store patch configuration information, the patch configuration information comprising instructions for performing actions along predetermined paths;
- a vision system configured to instruct the guiding apparatus to perform actions along predetermined paths stored in the patch library;
- and
- an operational area.
1 more element
A computer implemented method for performing sewing process, the method comprising:
- determining, by a vision system, location information associated with a position of at least one patch disposed on a surface of a substrate in an operational area of a guiding apparatus, and visual features of at least one of:
- an edge of the at least one patch and an interior feature of the at least one patch;
- and
- sewing the at least one patch according to patch configuration information in a patch library matching at least one of:
- the location information of the at least one patch and visual features of the at least one patch.
2 more elements
A guiding apparatus comprising:
- a patch library configured to store instructions for performing actions along predetermined paths;
- a vision system configured to instruct the guiding apparatus to perform actions along predetermined paths in accordance with the instructions stored in the patch library;
- and
- an operational area.
1 more element
Dependencies are inferred from the claim text.